2008
DOI: 10.1016/j.jeurceramsoc.2007.03.007
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Functionally graded chemical vapor deposited mullite environmental barrier coatings for Si-based ceramics

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Cited by 53 publications
(25 citation statements)
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“…It is well known that growth rate of mullite along [001] direction is most favorable implying that atomic rearrangements happen fastest along the (001) plane. 3,11 This is consistent with the observation that CVD mullite coatings exhibit a distinct texture, with the c axis of the mullite grains being oriented along the growth direction for a columnar grain microstructure. 13 Therefore, the gas phase Al/Si ratio was manipulated initially until mullite nucleated and the Al/Si ratio in the coating reached a value of 8.…”
Section: Methodssupporting
confidence: 84%
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“…It is well known that growth rate of mullite along [001] direction is most favorable implying that atomic rearrangements happen fastest along the (001) plane. 3,11 This is consistent with the observation that CVD mullite coatings exhibit a distinct texture, with the c axis of the mullite grains being oriented along the growth direction for a columnar grain microstructure. 13 Therefore, the gas phase Al/Si ratio was manipulated initially until mullite nucleated and the Al/Si ratio in the coating reached a value of 8.…”
Section: Methodssupporting
confidence: 84%
“…All reactant gases were premixed just before introduction into the hot-wall reactor. 3,4 The typical deposition temperature, total reactor pressure, and deposition time were 975 C, 75 Torr, and 3 h, respectively. It is well known that growth rate of mullite along [001] direction is most favorable implying that atomic rearrangements happen fastest along the (001) plane.…”
Section: Methodsmentioning
confidence: 99%
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“…Many CVD processes use the metal chloride-H 2 -CO 2 system [912]. In this study, thermodynamic calculations using HSC ™ were used to determine the viability of the CVD process.…”
Section: Methodsmentioning
confidence: 99%
“…This atomistic deposition method can provide high purity materials with structural control at atomic or nanometer scale level. Moreover, it can produce single layer, multilayer, composite, nanostructured, and functionally graded coating materials with well controlled dimension and unique structure at low processing temperatures [9]. Furthermore, one of the unique features of CVD over other deposition techniques is the non-line-of-sight-deposition capability that has allowed the coating of complex shaped components.…”
Section: Vapor Depositionmentioning
confidence: 99%