Fundamental properties and wear resistance of r.f.-sputtered TiB2 and Ti(B,N) coatings

Herr, W.; Matthes, Bernd; Broszeit, E.; Kloos, K. H.

doi:10.1016/0921-5093(91)90486-7

Cited by 75 publications

(25 citation statements)

References 2 publications

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“…In magnetron sputtering, the reported power densities are between 2 and 10 W cm\ (4, 39-42, 46, 46-61). The resulting deposition rates vary between 1.5 and 200 nm min\ for magnetron sputtering and electron-beam evaporation, respectively (4,25,34,(39)(40)(41)(46)(47)(48)(49)(50)(51)(52)(53)(54)(55)(56)(57)(58)(59)(60)(61). However, values of up to 1800 nm min\ are reported for arc evaporation of LaB (28).…”

Section: Pvd Methods For the Deposition Of Boride Coatingsmentioning

confidence: 88%

“…In contrast to that, TiB -based coatings with reported hardness values in the range of 3000 to 7000 HV (4,5,18,19,29,(35)(36)(37)(38)(39) are regarded as ultrahard coatings. These high values are expected to be the result of the dense, extremely fine-columnar structure (compare Fig.…”

Section: Fig 1-continuedmentioning

confidence: 96%

“…Due to the formation of multiphase films consisting of hard and soft lubricating phases during reactive sputtering, nitrogen-containing diboride-based coatings seem to be promising candidates for tribological applications (5,29,39,46,77,78). Figure 6 shows the wear coefficient of nitrogen-alloyed ZrB -based coatings determined by a block-on-cylinder test using coated Ck45 substrates as blocks and uncoated Ck45 cylinders in an oil-lubricated condition as a function of the nitrogen content (78).…”

Section: Tribological Propertiesmentioning

confidence: 99%

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Borides in Thin Film Technology

Mitterer

1997

Journal of Solid State Chemistry

194

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Section: Pvd Methods For the Deposition Of Boride Coatingsmentioning

confidence: 88%

Section: Fig 1-continuedmentioning

confidence: 96%

Section: Tribological Propertiesmentioning

confidence: 99%

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Borides in Thin Film Technology

Mitterer

1997

Journal of Solid State Chemistry

194

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“…Because the Ti 2p 3/2 spectrum of the TiB 2 film was clearly asymmetric [ Fig. 7(a)], it was fitted using two components T 1 …”

Section: Analysis Of the Ti 2p Spectrummentioning

confidence: 99%

XPS study of reactively sputtered Ti-B-N hard coatings

Ruby

Ott

Huang

et al. 2000

Surf. Interface Anal.

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Thin films (500 nm) of Ti–B–N have been produced by d.c. magnetron sputtering from a TiB2 target in various Ar+N2 gas mixtures. The atomic concentration of nitrogen in the films varies between 0 and 38 at.%. The ratio of boron to titanium in the films is fixed by the relative concentration of these two elements in the TiB2 sputtering target. Bonds of B–N, B–Ti, Ti–N and Ti–B are observed in the B 1s and the Ti 2p spectra. The change of shape observed in the N 1s spectra led to the conclusion that at low nitrogen concentration the nitrogen atoms are preferentially bonded with titanium atoms, in good agreement with thermodynamical data. By using quantitative information from the B 1s, Ti 2p and N 1s curve fittings, the formation of a film containing three separate phases (TiN, BN and TiB2) is discussed. Copyright © 2000 John Wiley & Sons, Ltd.

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“…have been produced by reactive sputtering and chemical vapor deposition on a variety of metalforming dies and machine parts to combat wear [4,5]. Despite their excellent chemical stability and high wear resistance over a wide range of temperatures, most borides cannot afford low friction to dry sliding surfaces.…”

Section: Abstictmentioning

confidence: 99%