2007
DOI: 10.1103/physrevb.75.235329
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Fundamental transport processes in ensembles of silicon quantum dots

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Cited by 55 publications
(90 citation statements)
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References 66 publications
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“…Actually, the Raman analysis described in section 3.1 provides consistence to the hypothesis of a larger number of NCs while preserving the mean NC crystalline size, which induces a shorter inter-NC distance and possibly causes Si coalescence. In fact, Si NC lateral coalescence at high Si content (above the percolation threshold) was reported in [16] in similar SL systems, producing the carrier wavefunction delocalization within the nanostructures and subsequent coupling of the electronic states. Due to the shorter inter-NC distance supported by the structural characterization, this effect might also take place in our devices, resulting in the relaxation of the quantum confinement effect, as observed in the past in III-V semiconductor quantum wells [24][25][26].…”
Section: Electrical and El Characterizationmentioning
confidence: 99%
“…Actually, the Raman analysis described in section 3.1 provides consistence to the hypothesis of a larger number of NCs while preserving the mean NC crystalline size, which induces a shorter inter-NC distance and possibly causes Si coalescence. In fact, Si NC lateral coalescence at high Si content (above the percolation threshold) was reported in [16] in similar SL systems, producing the carrier wavefunction delocalization within the nanostructures and subsequent coupling of the electronic states. Due to the shorter inter-NC distance supported by the structural characterization, this effect might also take place in our devices, resulting in the relaxation of the quantum confinement effect, as observed in the past in III-V semiconductor quantum wells [24][25][26].…”
Section: Electrical and El Characterizationmentioning
confidence: 99%
“…For heavily boron doped films, conductivity values of about 0.1 (Ohm cm) -1 were reported by Mirabella et al (Mirabella et al, 2010). However as shown in (Balberg et al, 2007) in this high Si-excess regime (above the percolation threshold) the photoluminescence observed for isolated Si-QDs is absent due to the growth of the cluster size and hence relaxation of the quantum confinement effect. For this reason this clustered structures seem less favorable for many of the illustrated application of Si-QDs reviewed here.…”
Section: Electrical Transport Propertiesmentioning
confidence: 85%
“…For this reason this clustered structures seem less favorable for many of the illustrated application of Si-QDs reviewed here. Conductivity in SiO 2 films with isolated Si-QDs is in the order of 10 -10 (Ohm cm) -1 (Balberg et al 2007). In recent years films representing this type of structure were intensively investigated especially for realization of silicon base light emitting devices (Perálvarez et al, 2006;Franzò et al, 2002;Prezioso et al, 2008) and references therein.…”
Section: Electrical Transport Propertiesmentioning
confidence: 99%
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“…Our findings strongly suggest that, when optimized, these structures can be a strong candidate for use in photovoltaic device applications. Further, by slightly modifying the topology, we were able to create isolated QD clusters that effectively formed a double-barrier tunneling junction (DBTJ) [6][7][8] that could store charges. The anisotropic random network is prepared as a thin film in a magnetron-sputtered physical vapor deposition chamber, the details of the fabrication procedure and characterization methods can be found in the Supplementary document.…”
mentioning
confidence: 99%