Future prospects for ECR plasma generators with improved charge state distributions

Alton, G. D.; Liu, Y.

doi:10.2514/6.1997-2402

Cited by 1 publication

(3 citation statements)

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“…To summarize, the scheme coupled with the utilization of highly efficient ECR sources has resulted in the production of high-volume, relatively high-density plasma (~10 11 cm −3 ), even though ECR sources are not known to scale well with volume [19][20][21][22][23][24][25][26]. This uniform, high-density plasma over a large volume at low power (a few hundred watts per source) can become an efficient plasma processing system in the near future.…”

Section: Discussionmentioning

confidence: 99%

“…Unlike most other configurations [20][21][22][23][24][25][26], the present scheme [27,28] utilizes multiple plasma sources placed on the periphery of a large volume cylindrical chamber of diameter D (figure 1) to produce high-density plasma. In order to distribute the sources, the system has M source planes, each having a suitable number of source ports (4, 6, 8, ..., 2N) located in a symmetric manner on the chamber on which the plasma sources are mounted.…”

Section: The Schemementioning

confidence: 99%

“…Although ECR has been used for various industrial applications [18,19], its use has been limited by the fact that ECRproduced plasmas do not scale well with volume [19][20][21][22][23][24][25][26] due to the small wavelength of microwaves. Inside an ECR source, microwaves propagate in a particular mode and are absorbed into the ECR zone to produce plasma.…”

Section: Introductionmentioning

confidence: 99%

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Studies on plasma production in a large volume system using multiple compact ECR plasma sources

Tarey

Ganguli

Sahu

et al. 2016

Plasma Sources Sci. Technol.

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This paper presents a scheme for large volume plasma production using multiple highly portable compact ECR plasma sources (CEPS) (Ganguli et al 2016 Plasma Source Sci. Technol. 25 025026). The large volume plasma system (LVPS) described in the paper is a scalable, cylindrical vessel of diameter ≈1 m, consisting of source and spacer sections with multiple CEPS mounted symmetrically on the periphery of the source sections. Scaling is achieved by altering the number of source sections/the number of sources in a source section or changing the number of spacer sections for adjusting the spacing between the source sections. A series of plasma characterization experiments using argon gas were conducted on the LVPS under different configurations of CEPS, source and spacer sections, for an operating pressure in the range 0.5-20 mTorr, and a microwave power level in the range 400-500 W per source. Using Langmuir probes (LP), it was possible to show that the plasma density (~1 − 2 × 10 11 cm −3 ) remains fairly uniform inside the system and decreases marginally close to the chamber wall, and this uniformity increases with an increase in the number of sources. It was seen that a warm electron population (60-80 eV) is always present and is about 0.1% of the bulk plasma density. The mechanism of plasma production is discussed in light of the results obtained for a single CEPS (Ganguli et al 2016 Plasma Source Sci. Technol. 25 025026).

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