2008
DOI: 10.1103/physrevb.77.155326
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Ga-assisted catalyst-free growth mechanism of GaAs nanowires by molecular beam epitaxy

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Cited by 412 publications
(529 citation statements)
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“…The growth rate of the nanowire is given by the As 4 flux. 50 The samples presented in this paper have been obtained at arsenic pressures between 3 ϫ 10 −6 and 3 ϫ 10 −7 mbar, which represent growth rates, respectively, between 3 and 0.3 m / h. We have shown in the past that a reduction in the growth rate results in an increase in the fraction of wurtzite in the nanowire. 51 The structure of the nanowires was studied by highresolution transmission electron microscopy ͑HRTEM͒ in a Philips/FEI CM 300.…”
Section: Methodsmentioning
confidence: 99%
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“…The growth rate of the nanowire is given by the As 4 flux. 50 The samples presented in this paper have been obtained at arsenic pressures between 3 ϫ 10 −6 and 3 ϫ 10 −7 mbar, which represent growth rates, respectively, between 3 and 0.3 m / h. We have shown in the past that a reduction in the growth rate results in an increase in the fraction of wurtzite in the nanowire. 51 The structure of the nanowires was studied by highresolution transmission electron microscopy ͑HRTEM͒ in a Philips/FEI CM 300.…”
Section: Methodsmentioning
confidence: 99%
“…49,50 The growth precursors are atomic gallium and As 4 molecules. Gallium forms droplets at the surface and drives the nucleation of the nanowires.…”
Section: Methodsmentioning
confidence: 99%
“…In order to induce vapor-liquid-solid (VLS) growth of GaAs NWs via Ga droplet catalysts 36,37 , Ga and As fluxes were simultaneously deposited on the substrate surface with the deposition rate of 0.1 and 0.15 ML/s, respectively. The GaAs NWs were grown for 90 min, allowing the formation of the GaAs NWs with ~2 µm-length and ~80 nm in diameter.…”
mentioning
confidence: 99%
“…The core was obtained by the self-catalysed Ga-assisted process (VLS) [34][35][36][37], with a nominal gallium growth rate of 0.27 μm/h, for 45 min, at T = 630°C and V/III beam equivalent flux ratio of 60. The p-doping was achieved with a beryllium flux corresponding to a doping level of 3.5 × 10 19 atoms/cm 3 for planar growth [38].…”
Section: Nanowire Growthmentioning
confidence: 99%