1995
DOI: 10.1063/1.114148
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GaxIn1−xAs multiple-quantum-wire lasers grown by the strain-induced lateral-layer ordering process

Abstract: Long wavelength ͑ϳ1.55 m͒ Ga x In 1Ϫx As multiple-quantum-wire ͑MQWR͒ lasers have been grown by a single-step molecular beam epitaxy technique. The MQWR heterostructure was fabricated in situ using the strain-induced lateral-layer ordering process. The wire formation was confirmed by cross-sectional transmission electron microscopy and polarized photoluminescence spectroscopy. The 77 K threshold current densities for the MQWR laser diodes with laser cavities along ͓110͔ and ͓110͔ directions show an anisotropy … Show more

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Cited by 55 publications
(44 citation statements)
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“…Auger recombination will also be greatly reduced [4][5][6]. Also, the temperature sensitivity is reduced by an order of magnitude compared with strain-free structures.…”
mentioning
confidence: 90%
See 1 more Smart Citation
“…Auger recombination will also be greatly reduced [4][5][6]. Also, the temperature sensitivity is reduced by an order of magnitude compared with strain-free structures.…”
mentioning
confidence: 90%
“…The k · p model is the most popular one for treating electronic structures of semiconductor quantum wells or superlattices. However, when applied to complex structures such as self-assembled quantum wires [4][5][6][7][8][9] or quantum dots [13,18,19], the method becomes very cumbersome if one wish to implement the correct boundary conditions that take into account the differences in k · p band parameters for different materials involved. EBOM is free of this problem, since different material parameters are used at different atomic sites in a natural way.…”
Section: Theoretical Approachmentioning
confidence: 99%
“…Furthermore, Ga x In 1−x As/InP multiple-layered Q-wire lasers with an emitting wavelength of 1.69 µm at T = 77 K were fabricated by the SI-LO method [56], and GaInAs/InP single Q-wire lasers with an emitting wavelength of more than 1.3 µm at T = 15 K were fabricated by selective growth on a V-groove substrate [77].…”
Section: B Long-wavelength Q-wire and Q-dot Lasersmentioning
confidence: 99%
“…2. : 1) fractional (submonoatomic) layer growth on the step edge of a vicinal substrate [13], [47], [48]; 2) a combination of lithography, etching, and embedding growth [49]- [52]; 3) selective growth on a patterned substrate [53]- [55]; 4) SI-LO of binary superlattices [56]; 5) SI-SO growth [46]; and 6) cleaved edge overgrowth [40]. We have investigated a fabrication method that combines EB lithography, etching, and two-step organometallic vapor-phaseepitaxial (OMVPE) growth, because this method has better position controllability and wider applications than other methods.…”
Section: A Various Fabrication Techniques Of Q-wire Structuresmentioning
confidence: 99%
“…reduction of bandgap and polarisation anisotropies) and can be characterised by its average composition, average amplitude, wavelength and direction. In general, LCM is avoided in device structures; however, with the recent emergence of nanotechnology, efforts have been made to exploit it for quantum confinement devices such as quantum wire (QWR) based detectors and lasers [6,7].…”
Section: Introductionmentioning
confidence: 99%