2022
DOI: 10.1109/tnano.2022.3168495
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Ga-In Nanoparticle Induced UV Plasmonic Impact on Heterojunction Based Deep UV Photodetector

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Cited by 13 publications
(11 citation statements)
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“…Samples were annealed at 300°C, 500°C, and 700°C for 2 hours each as shown in Figure 1. Annealing is a continuous and sequential process that helps to adjust the thickness of the flakes also [15,16]. The SAT and annealing details of the three categories of samples are summarized in Table 1.…”
Section: Annealing Sequence and Nfs Formationmentioning
confidence: 99%
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“…Samples were annealed at 300°C, 500°C, and 700°C for 2 hours each as shown in Figure 1. Annealing is a continuous and sequential process that helps to adjust the thickness of the flakes also [15,16]. The SAT and annealing details of the three categories of samples are summarized in Table 1.…”
Section: Annealing Sequence and Nfs Formationmentioning
confidence: 99%
“…In these samples, nanowires and beads are observed as a more dominant nanostructure. Since selfassembly requires no external interference and hence the prenucleation was not done by self-assembly; these grown structures have more annealing effect than self-assembly [16]. The morphological study of the deposited samples was followed by XRD analysis for each category of samples to investigate their crystallinity.…”
Section: Materials Characterizationmentioning
confidence: 99%
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“…Now the resulting UV plot agrees with the sample substrate S3 morphology. For the direct bandgap, the absorption follows a power law of the form [33],…”
Section: Materials Analysismentioning
confidence: 99%