2018
DOI: 10.1109/jphotov.2018.2802203
|View full text |Cite
|
Sign up to set email alerts
|

GaAs/Indium Tin Oxide/Si Bonding Junctions for III-V-on-Si Hybrid Multijunction Cells With Low Series Resistance

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
26
0

Year Published

2019
2019
2023
2023

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 21 publications
(26 citation statements)
references
References 49 publications
0
26
0
Order By: Relevance
“…Regarding the methods to construct III–V-on-Si architectures, a variety of studies have been reported. One of the most straightforward approaches would be the heteroepitaxial growth of GaAs-relevant materials on c-Si substrates; , however, despite the progress of elaborative buffer layer techniques to compensate for the difference in lattice constants and thermal expansion coefficients between GaAs and Si, the layer quality achieved with this type of approach remains a challenge. , Alternatively, bonding-based approaches have gained increasing attention, and as previously mentioned, impressive results have already been obtained by mechanically stacked four-terminal tandems and surface-activation-bonded two-terminal tandems. , We have also developed a unique semiconductor bonding strategy, termed smart stack. Using well-organized Pd nanoparticle (NP) arrays as bonding mediators, series-connected two-terminal tandem cells consisting of III–V and c-Si subcells have been successfully fabricated with the best efficiency of 30.8% . To make the smart stack technique more attractive, however, it would be preferable to find alternative materials for costly Pd, whose price has recently been rising due to the increasing demand of many other industrial applications…”
Section: Introductionmentioning
confidence: 99%
“…Regarding the methods to construct III–V-on-Si architectures, a variety of studies have been reported. One of the most straightforward approaches would be the heteroepitaxial growth of GaAs-relevant materials on c-Si substrates; , however, despite the progress of elaborative buffer layer techniques to compensate for the difference in lattice constants and thermal expansion coefficients between GaAs and Si, the layer quality achieved with this type of approach remains a challenge. , Alternatively, bonding-based approaches have gained increasing attention, and as previously mentioned, impressive results have already been obtained by mechanically stacked four-terminal tandems and surface-activation-bonded two-terminal tandems. , We have also developed a unique semiconductor bonding strategy, termed smart stack. Using well-organized Pd nanoparticle (NP) arrays as bonding mediators, series-connected two-terminal tandem cells consisting of III–V and c-Si subcells have been successfully fabricated with the best efficiency of 30.8% . To make the smart stack technique more attractive, however, it would be preferable to find alternative materials for costly Pd, whose price has recently been rising due to the increasing demand of many other industrial applications…”
Section: Introductionmentioning
confidence: 99%
“…In this study, for the purpose of simplicity, we used Si wafers as representative semiconductor materials. However, the proposed method can be easily extended to other semiconductors, given that numerous wafer-bonding experimental demonstrations between dissimilar materials are reported to date [4,[26][27][28][29][30][31].…”
Section: Methodsmentioning
confidence: 99%
“…C 2020, 6, 28 2 of 10 Thus, semiconductor bonding is a promising technique for realizing high-performance semiconductor optoelectronics. Hence, it is employed in the fabrication of a variety of devices, such as light-emitting diodes [24,25], lasers [4,26,27], photodetectors [28,29], and solar cells [27,30,31]. In the present study, we fabricate a Si/GQD/Si double heterostructure via semiconductor wafer bonding, towards the realization of high-efficiency nano-optoelectronic devices.…”
Section: Introductionmentioning
confidence: 99%
“…Argon atoms are used to remove the oxide from the surfaces and high force is used to bring the wafer in contact. [ 155 ] In the end, H 2 O 2 and NH 4 OH solutions are used to get high quality and strong bonding. [ 146 ] The SAB fabrication procedure of GaInP/GaAs/Si tandem SC is schematically shown in Figure 6b.…”
Section: Iii–vmentioning
confidence: 99%