1989
DOI: 10.1049/el:19891002
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GaAs integrated Hall sensor with temperature-stabilised characteristics up to 300°C

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Cited by 12 publications
(7 citation statements)
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“…Due to the inherently poor silicon Hall sensor material properties, devices made of III-V semiconductors have attracted a great deal of interest by virtue of their high electron mobility combined with moderate sheet carrier densities, low temperature dependences of the output Hall voltage and large signal-to-noise ratios (S/N) [6]- [10]. However, the majority of this work to date has been concerned with single Hall elements with no reports of fully integrated Hall Effect circuit using the III-V semiconductors apart from [11]- [13] describing a hybrid circuit using ion implanted GaAs for which the performances were less than ideal due to the difficulties of Manuscript received September 21, 2014; revised November 2, 2014; accepted November 2, 2014. Date of publication November 5, 2014; date of current version January 15, 2015.…”
Section: Introductionmentioning
confidence: 99%
“…Due to the inherently poor silicon Hall sensor material properties, devices made of III-V semiconductors have attracted a great deal of interest by virtue of their high electron mobility combined with moderate sheet carrier densities, low temperature dependences of the output Hall voltage and large signal-to-noise ratios (S/N) [6]- [10]. However, the majority of this work to date has been concerned with single Hall elements with no reports of fully integrated Hall Effect circuit using the III-V semiconductors apart from [11]- [13] describing a hybrid circuit using ion implanted GaAs for which the performances were less than ideal due to the difficulties of Manuscript received September 21, 2014; revised November 2, 2014; accepted November 2, 2014. Date of publication November 5, 2014; date of current version January 15, 2015.…”
Section: Introductionmentioning
confidence: 99%
“…Analysis of the conductivity with respect to the absolute value, as well as the temperature dependence, volume fraction, grain size, and surface activity of the second phase delivered convincing evidence for the adequacy of the quantitative model of "heterogeneous doping" (3,4). The basic defect inducing process for a silver halide may be written as VA + AgAg ~ AgA + V~g [1] where VA denotes the free active adsorption site and where sufficient accumulation of V~g (depletion of Ag § gives rise to an enhanced conductivity. The effect on the energy profiles near the interface is shown in Fig.…”
Section: Ute Lauer and Joachim Maiermentioning
confidence: 99%
“…For AgC1/-y-A120~ and AgBr/~/-A120~ (where ~/-A1203 represents a highly surface active second phase), the enthalpy and entropy change of the above process (Eq. [1]) are compared with the data for a "free" surface, and a less active contact phase in Table I. Equation [1] is analogous to the process characterizing the Br~nsted surface acidity/ basicity of solids such as ~-A1203, SiO2 with respect to aqueous solutions.…”
Section: Ute Lauer and Joachim Maiermentioning
confidence: 99%
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