2020
DOI: 10.1016/j.jmapro.2020.11.006
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GaAs manufacturing processes conditions for micro- and nanoscale devices

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Cited by 9 publications
(5 citation statements)
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“…Many innovational methods are exploited for micro/nano manufacturing, such as reactive ion etching [7,8], lithography [9], chemical vapour deposition [10], electrochemical processing [11], template [12], self-assembly [13] etc. But these methods have complicated procedures and multistep, which are time wasted.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Many innovational methods are exploited for micro/nano manufacturing, such as reactive ion etching [7,8], lithography [9], chemical vapour deposition [10], electrochemical processing [11], template [12], self-assembly [13] etc. But these methods have complicated procedures and multistep, which are time wasted.…”
Section: Introductionmentioning
confidence: 99%
“…FIGURE7 A setup with a clear deviation between the interference and the focal plane and an elliptical spot shape on a stainless steel sample fabricated by the setup[53] …”
mentioning
confidence: 99%
“…Elliptical micropillars were fabricated by reactive ion-plasma etching in combination with contact photolithography (365 nm) based on a thick negative photoresist [41][42][43]. The etching technique has been optimized to produce highly vertical side walls with minimum roughness since the verticality of the sidewalls is especially important for precise control of the polarization mode splitting.…”
Section: Fabrication Of the Structurementioning
confidence: 99%
“…One of the main challenges to turn a promising material into a nanodevice is the local implementation of the desired physical parameters. Among several techniques, the most common procedures use either a mask which determines the regions of the modifiable areas [12,20,21] or use a well-focused beam that directly damage or alters the material properties in the irradiated section [22][23][24][25][26].…”
Section: Introductionmentioning
confidence: 99%