2001
DOI: 10.1016/s0168-9002(01)00820-8
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GaAs structures for X-ray imaging detectors

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Cited by 24 publications
(21 citation statements)
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“…The high resistivity GaAs material used in this study was produced at the Tomsk State University by the high temperature diffusion of Cr into n-type melt-grown wafers [22]. This technique previously demonstrated to provide sensors with resistivities in the order of cm [23], [28], [29] via high compensation rates.…”
Section: Detector Fabrication and Chip Descriptionmentioning
confidence: 99%
See 1 more Smart Citation
“…The high resistivity GaAs material used in this study was produced at the Tomsk State University by the high temperature diffusion of Cr into n-type melt-grown wafers [22]. This technique previously demonstrated to provide sensors with resistivities in the order of cm [23], [28], [29] via high compensation rates.…”
Section: Detector Fabrication and Chip Descriptionmentioning
confidence: 99%
“…However, in the past decade, an alternative approach of producing GaAs sensors was introduced to overcome these problems [22]. It is based on the compensation of GaAs wafers by chromium (Cr) diffusion and has shown to provide fully active, high resistivity (HR) sensors with thicknesses up to 1 mm [21].…”
Section: Introductionmentioning
confidence: 99%
“…al. in 2001, where standard n-type GaAs wafers are doped with Cr by diffusion [4]. The Cr compensates the excess electrons in this material, thus achieving high enough resistivity to allow it to be used as a photoconductor detector with ohmic contacts.…”
Section: Chromium-compensated Gallium Arsenidementioning
confidence: 99%
“…The thermal conditions employed do not allow one to produce bulk i-GaAs with an EL2 density less than 10 15 cm -3 [24].…”
Section: Selection Of a Sensing Materialsmentioning
confidence: 99%