The damage induced in GaAs crystals irradiated with dual-ion beam (low-energy I2+ and high-energy Fe9+), producing simultaneous nuclear ( Sn) and electronic ( Se) energy depositions, was investigated using several characterization techniques. Analysis of the damage buildup shows that Sn alone (single 900 keV ion beam) leads, in a two-step process, to full amorphization of the irradiated layer (at a fluence of 1.5 nm−2) and to the development of a high (2.2%) elastic strain. Conversely, only one step in the disordering process is observed upon dual-ion beam irradiation (i.e., 900 keV I2+ and 27 MeV Fe9+, Sn& Se); hence, amorphization is prevented and the elastic strain remains very weak (below 0.2%). These results provide a strong evidence that, in GaAs, the electronic energy deposition can induce an efficient dynamic annealing of the damage created in collision cascades formed during nuclear energy deposition.