Gallium ion extraction from a plasma sputter-type ion source

Vasquez, Magdaleno R.; Imakita, S.; Kasuya, T.; Maeno, S.; Wada, M.

doi:10.1063/1.3292933

Cited by 6 publications

(4 citation statements)

References 6 publications

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“…Details of the experimental system have been described elsewhere [6]. In the present setup, shown in Fig.…”

Section: Methodsmentioning

confidence: 99%

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Plasma Sputter-type Ion Source with Wire Electrodes for Low-energy Gallium Ion Extraction

Vasquez¹,

Kasuya²,

Maeno³

et al. 2011

AIP Conference Proceedings

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Low-energy ions of gallium (Ga) and argon (Ar) were extracted from a plasma sputter-type ion source system that utilized a tungsten (W) wire extractor geometry. The 90% transparent W wire extractor configuration had shown that the system was capable of producing an ion beam with the energy as low as 10 eV in a dc filament discharge and 50 eV in a radio frequency (rf) excited system. In the present investigation, Ar plasma was sustained in an ion source chamber through an inductively coupled 13.56 MHz rf power source. Negatively biased liquid Ga target suspended on a W reservoir was sputtered and postionized prior to extraction. Mass spectral analyses revealed a strong dependence of the Ga + current on the induced target bias.

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“…Details of the experimental system have been described elsewhere [6]. In the present setup, shown in Fig.…”

Section: Methodsmentioning

confidence: 99%

“…Recently, a broad beam of gallium (Ga) and argon (Ar) ions were extracted from a plasma sputter-type radio frequency (rf) driven ion source [6]. Positive ions of Ga were extracted from multiaperture extraction electrodes via sputtering and postionization in plasma.…”

Section: Introductionmentioning

confidence: 99%

Plasma Sputter-type Ion Source with Wire Electrodes for Low-energy Gallium Ion Extraction

Vasquez¹,

Kasuya²,

Maeno³

et al. 2011

AIP Conference Proceedings

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“…Several sources produce ion beams with different levels of stability, diverse energy ranges, beam profiles, and usability [3,4]. Particular interest lies on material modification wherein ions are used to alter the structure of a crystalline material to some degree.…”

Section: Introductionmentioning

confidence: 99%

Effects Of Negative Ag Ions On The Surface Of (200) Single-Crystalline MgO Substrates

Malapit¹,

Bugante²,

Mahinay³

et al. 2014

Proceedings of the 12th Asia Pacific Physics Conference (APPC12)

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Negative silver ions with energies between 200 eV and 700 eV are extracted from a plasma sputter-type negative ion source to process single crystal MgO from samples using a plasma sputter-type negative ion source. X-ray diffraction measurement results reveal that samples processed by 200 eV and 500 eV ion energies exhibited deposition of silver while the sample bombarded with 700 eV ion energy showed signs of surface modification that led to amorphization. Theoretically predicted XRD curves constructed from the deformed lattice of silver provide a good fit to the experimentally measured ones for the sample bombarded with 200 eV ion energy.KEYWORDS: plasma sputter type negative ion source, low energy silver ion beam, single crystal magnesium oxide, x-ray diffraction

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“…Different types of ion sources provide ion beams with certain degrees of stability, energy ranges, various beam profile, and usability. [4][5][6] To understand beam characteristics, reliable, effective, and versatile measurement techniques and diagnostics must be employed. A familiar and simple device is the Faraday cup (FC) which, in principle, is a beam blocker linked to a current reader.…”

Section: Introductionmentioning

confidence: 99%

Electrostatic energy analyzer measurements of low energy zirconium beam parameters in a plasma sputter-type negative ion source

Malapit

Mahinay

Poral

et al. 2012

Review of Scientific Instruments

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A plasma sputter-type negative ion source is utilized to produce and detect negative Zr ions with energies between 150 and 450 eV via a retarding potential-type electrostatic energy analyzer. Traditional and modified semi-cylindrical Faraday cups (FC) inside the analyzer are employed to sample negative Zr ions and measure corresponding ion currents. The traditional FC registered indistinct ion current readings which are attributed to backscattering of ions and secondary electron emissions. The modified Faraday cup with biased repeller guard ring, cut out these signal distortions leaving only ringings as issues which are theoretically compensated by fitting a sigmoidal function into the data. The mean energy and energy spread are calculated using the ion current versus retarding potential data while the beam width values are determined from the data of the transverse measurement of ion current. The most energetic negative Zr ions yield tighter energy spread at 4.11 eV compared to the least energetic negative Zr ions at 4.79 eV. The smallest calculated beam width is 1.04 cm for the negative Zr ions with the highest mean energy indicating a more focused beam in contrast to the less energetic negative Zr ions due to space charge forces.

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Gallium ion extraction from a plasma sputter-type ion source

Cited by 6 publications

References 6 publications

Plasma Sputter-type Ion Source with Wire Electrodes for Low-energy Gallium Ion Extraction

Plasma Sputter-type Ion Source with Wire Electrodes for Low-energy Gallium Ion Extraction

Effects Of Negative Ag Ions On The Surface Of (200) Single-Crystalline MgO Substrates

Electrostatic energy analyzer measurements of low energy zirconium beam parameters in a plasma sputter-type negative ion source

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