Nitride Semiconductor Light-Emitting Diodes (LEDs) 2014
DOI: 10.1533/9780857099303.1.66
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Gallium nitride (GaN) on sapphire substrates for visible LEDs

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Cited by 3 publications
(3 citation statements)
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“…14,15 Unlike other semiconductors including silicon (Si) and gallium arsenide (GaAs), of which device structures are constructed on the same type of single-crystalline substrates, native single-crystalline substrates of gallium nitride (GaN) were not available until very recently. 16 Development of "device-quality" GaN and related materials had been hampered for about 17 years, 17 since the first attempt of the epitaxial growth of GaN, 17,18 until Amano and Akasaki developed a special epitaxial growth technique using a low-temperature buffer layer. 19 This strained heteroepitaxial growth works well only for the growth along the cdirection, that is, to yield a (0001) plane surface of wurtzite structure of GaN.…”
mentioning
confidence: 99%
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“…14,15 Unlike other semiconductors including silicon (Si) and gallium arsenide (GaAs), of which device structures are constructed on the same type of single-crystalline substrates, native single-crystalline substrates of gallium nitride (GaN) were not available until very recently. 16 Development of "device-quality" GaN and related materials had been hampered for about 17 years, 17 since the first attempt of the epitaxial growth of GaN, 17,18 until Amano and Akasaki developed a special epitaxial growth technique using a low-temperature buffer layer. 19 This strained heteroepitaxial growth works well only for the growth along the cdirection, that is, to yield a (0001) plane surface of wurtzite structure of GaN.…”
mentioning
confidence: 99%
“…III-N materials and devices have brought tremendous benefits to mankind as energy-efficient and environmentally friendly light sources . The potential of the materials has been recognized in many applications of current- and next-generation electronics and photonics. , Unlike other semiconductors including silicon (Si) and gallium arsenide (GaAs), of which device structures are constructed on the same type of single-crystalline substrates, native single-crystalline substrates of gallium nitride (GaN) were not available until very recently . Development of “device-quality” GaN and related materials had been hampered for about 17 years, since the first attempt of the epitaxial growth of GaN, , until Amano and Akasaki developed a special epitaxial growth technique using a low-temperature buffer layer .…”
mentioning
confidence: 99%
“…However, the allowed transition of Ti 3+ has a much faster decay rate; so, faster cool-down times could be enabled for semiconductor sensor circuitry grown on Ti 3+ :Al 2 O 3 substrates and cooled optically to cryogenic temperatures. Sapphire is an excellent substrate for GaN, Al x Ga 1-x N or In x Ga 1-x N, and ZnO epitaxy [21,45,46]; so, if cooling were to be demonstrated with laser diodes, the improved performance of imaging arrays in outer space could be achieved in the near future.…”
Section: Discussionmentioning
confidence: 99%