“…14,15 Unlike other semiconductors including silicon (Si) and gallium arsenide (GaAs), of which device structures are constructed on the same type of single-crystalline substrates, native single-crystalline substrates of gallium nitride (GaN) were not available until very recently. 16 Development of "device-quality" GaN and related materials had been hampered for about 17 years, 17 since the first attempt of the epitaxial growth of GaN, 17,18 until Amano and Akasaki developed a special epitaxial growth technique using a low-temperature buffer layer. 19 This strained heteroepitaxial growth works well only for the growth along the cdirection, that is, to yield a (0001) plane surface of wurtzite structure of GaN.…”