2009
DOI: 10.1063/1.3120222
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GaN-based light-emitting diode with textured indium tin oxide transparent layer coated with Al2O3 powder

Abstract: Surface-textured InGaN/GaN light-emitting diodes (LEDs) coated with transparent Al2O3 powder were fabricated by natural lithography combined with inductively coupled plasma etching. For surface texturing, 300 nm size Al2O3 powder is used as an etching mask by simply coating the surface using a spin-coating process. Also, the powders are left on the surface after surface texturing to further increase extraction efficiency. At 20 mA, the light output power of the textured indium tin oxide (ITO) InGaN/GaN LEDs co… Show more

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Cited by 36 publications
(18 citation statements)
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“…Various approaches have been adopted to extract the trapped light in the LED, and great efforts have been made in incorporating photonic crystal (PhC) into GaN-based LED to improve the light extraction [1][2][3][4][5][6][7][8][9][10][11][12][13][14]. Shallow etched PhC gratings are employed on the surface of different materials, such as GaN [1, 2,4], indium tin oxide (ITO) [9,10], or thin polymer layer [11,12]. In most publications, the strategy of using a PhC grating mainly relies on Bragg diffraction of the trapped guided modes from the LEDs.…”
Section: Introductionmentioning
confidence: 99%
“…Various approaches have been adopted to extract the trapped light in the LED, and great efforts have been made in incorporating photonic crystal (PhC) into GaN-based LED to improve the light extraction [1][2][3][4][5][6][7][8][9][10][11][12][13][14]. Shallow etched PhC gratings are employed on the surface of different materials, such as GaN [1, 2,4], indium tin oxide (ITO) [9,10], or thin polymer layer [11,12]. In most publications, the strategy of using a PhC grating mainly relies on Bragg diffraction of the trapped guided modes from the LEDs.…”
Section: Introductionmentioning
confidence: 99%
“…There are several methods to maintain the angle of the emitted light from the active region within the critical angle, such as changing the LED chip shape, reducing the thickness of the film, and roughening the surface [10,11]. Previous researchers [12][13][14][15][16][17][18] have reported about Ni film as an interlayer in LED structure to improve Ohmic contact and also treated-surface layers to increase the light output of GaN-based LEDs. Most of them focus on surface-treated GaN, ITO, and sapphire layers, while very few report [6,11] on treated-ZnO layers to increase the light output of GaN-based LEDs.…”
Section: Introductionmentioning
confidence: 97%
“…Various ordered and disordered ITO structures have been fabricated by wet chemical etching or inductively coupled plasma reactive ion etching (ICP-RIE) processes. [3][4][5][6][7][8] Wet etching has a good input-output ratio but lacks controllability in achieving designed structure profiles. The process of ICP-RIE is an effective method for ITO etching with a high etching rate and good selectivity; however, the incident direction of the reactive ions is always normal to the sample, which does not provide flexibility for controlling the geometry of ITO patterns.…”
Section: Introductionmentioning
confidence: 99%