2022
DOI: 10.1109/tpel.2022.3172659
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GaN-Based Multichip Half-Bridge Power Module Integrated on High-Voltage AlN Ceramic Substrate

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Cited by 17 publications
(4 citation statements)
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“…Both GaN MIS-HEMT and Si MOSFET chips are adopted on an aluminum nitride (AlN) substrate. For decades, AlN ceramics are promising option for power electronics packaging due to their high thermal conductivity (>170 W m −1 K −1 ) and strong electrical isolation [28]. A top view of the chip-on-board and the substrate layout assemblies for the two cascode switches is shown in figure 3(b).…”
Section: Multi-gan-chip Cascode Module Processmentioning
confidence: 99%
“…Both GaN MIS-HEMT and Si MOSFET chips are adopted on an aluminum nitride (AlN) substrate. For decades, AlN ceramics are promising option for power electronics packaging due to their high thermal conductivity (>170 W m −1 K −1 ) and strong electrical isolation [28]. A top view of the chip-on-board and the substrate layout assemblies for the two cascode switches is shown in figure 3(b).…”
Section: Multi-gan-chip Cascode Module Processmentioning
confidence: 99%
“…9. The area of the overall drive chip is 1.7*1.8mm 2 , where the area of the half-bridge adaptive load gate drive circuit proposed in this paper is 0.7*0.8mm 2 . The photo also shows the location of the input receiver and dead time, level shift, protection circuit, bootstrap diode, etc.…”
Section: Test Analysismentioning
confidence: 99%
“…GaN HEMTs have significant advantages over silicon MOSFETs and are more suitable for high voltage and high frequency applications. The research of GaN driver technology has become a hot spot at present [1,2,3,4,5]. In general, the output drive current of GaN half-bridge driver is fixed.…”
Section: Introductionmentioning
confidence: 99%
“…AlGaN/GaN high electron mobility transistors (HEMTs) have attracted great attention in high-frequency and high-power electronics owing to the excellent material properties such as high carrier mobility, high-density carriers of two-dimensional electron gas (2DEG), and high critical breakdown field. [1][2][3][4][5][6][7][8][9] However, due to the fact that devices operate at high voltage and high frequency, parasitic inductance and capacitance affect the switching characteristics of devices, making it difficult to accurately model the switching process of GaN devices. [10][11][12][13][14][15] In recent years, there have been many studies of modeling the switching characteristics of GaN devices.…”
Section: Introductionmentioning
confidence: 99%