2011
DOI: 10.1016/j.jallcom.2010.12.087
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GaN crystals prepared through solid-state metathesis reaction from NaGaO2 and BN under high pressure and high temperature

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Cited by 21 publications
(10 citation statements)
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“…So, the synthesis temperature decreases in our high pressure experiments. This has also been observed for some other materials, such as GaN crystal synthesis under HPHT [16]. The synthesis temperature of Cd 7 P 10 increases when the pressure is elevated from 2.0 to 4.5 GPa, which might indicate that the melting point of Cd versus the applied pressure has a positive slope.…”
Section: Resultssupporting
confidence: 66%
See 1 more Smart Citation
“…So, the synthesis temperature decreases in our high pressure experiments. This has also been observed for some other materials, such as GaN crystal synthesis under HPHT [16]. The synthesis temperature of Cd 7 P 10 increases when the pressure is elevated from 2.0 to 4.5 GPa, which might indicate that the melting point of Cd versus the applied pressure has a positive slope.…”
Section: Resultssupporting
confidence: 66%
“…The optimal method is based on the reaction of the elemental components under high pressure and high temperature (HPHT). The HPHT method has been reported to be an effective way of synthesizing pure-phase, bulk and nearly fully densified polystalline samples such as GaN, ReB 2 , ZrC-SiC and B 6 O [ [16][17][18][19], while these materials are usually difficult to prepare at ambient pressures. Cadmium (Cd) and P have a low melting point and vaporize easily at ambient pressures.…”
Section: Introductionmentioning
confidence: 99%
“…which can simply be viewed as ion exchange between Mo 6+ and B 3+ 14 32 40 , 41 42 . As expected, compositional analyses using EDX show the same Mo: N molar ratio for both phases.…”
Section: Resultsmentioning
confidence: 99%
“…To enhance the characteristics of GaN-based devices, the introduction of freestanding (FS) GaN substrates into the applicable devices is essential. To achieve high crystalline freestanding GaN crystals, a number of researchers have studied various growth methods [5][6][7][8][9][10]. Of these methods, the outstanding characteristics of hydride vapor phase epitaxy (HVPE) growth, with a high growth rate and a high crystalline growth capability, can provide significant advances to achieve freestanding GaN crystals with a large scalability and economic advantages [11].…”
Section: Introductionmentioning
confidence: 99%