2011
DOI: 10.1109/jstqe.2010.2082504
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GaN Nanowires Grown by Molecular Beam Epitaxy

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Cited by 114 publications
(106 citation statements)
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“…GaN and In(Ga)N nanowires can be epitaxially grown catalyst free on silicon substrates with aerial density in the range of 10 8 -10 11 cm À 2 and lengths up to a few micrometres [23][24][25][26][27][28][29][30][31][32] . The nanowires grow vertically in the wurtzite crystalline form and optical emission from them in the spectral range of 366-700 nm has been recorded by varying the In composition.…”
mentioning
confidence: 99%
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“…GaN and In(Ga)N nanowires can be epitaxially grown catalyst free on silicon substrates with aerial density in the range of 10 8 -10 11 cm À 2 and lengths up to a few micrometres [23][24][25][26][27][28][29][30][31][32] . The nanowires grow vertically in the wurtzite crystalline form and optical emission from them in the spectral range of 366-700 nm has been recorded by varying the In composition.…”
mentioning
confidence: 99%
“…The nanowires grow vertically in the wurtzite crystalline form and optical emission from them in the spectral range of 366-700 nm has been recorded by varying the In composition. Extensive structural characterization indicates that the nanowires are relatively free of extended defects 23,24,[27][28][29][31][32][33][34] . They can be doped p-and n-type with suitable dopant species up to levels similar to those achieved in planar structures.…”
mentioning
confidence: 99%
“…These growth techniques include metal-catalyzed metal-organic chemical vapor deposition (MOCVD) by the vapor-liquid-solid (VLS) mechanism, spontaneous formation in molecular beam epitaxy (MBE), and selective area growth by both MBE and MOCVD [1][2][3][4][5][6][7][8][9][10][11]. Even when using the same type of growth process, the resulting nanostructures can vary greatly in terms of geometry, morphology, crystallographic direction and defect content, leading to widely varying optical and electrical properties.…”
Section: Introductionmentioning
confidence: 99%
“…Even when using the same type of growth process, the resulting nanostructures can vary greatly in terms of geometry, morphology, crystallographic direction and defect content, leading to widely varying optical and electrical properties. These are determined by the specific details in the synthesis, such as the type, size and uniformity of the metal catalyst (if used), substrate type and orientation, precursor and carrier gases, and growth conditions (temperature, pressure, V/III ratio) [11][12][13]. Specifically, GaN nanowires have been reported by Ni catalyzed MOCVD to have a-axis or m-axis orientation grown on r-plane sapphire substrate with triangular crosssections [5,8,[14][15][16].…”
Section: Introductionmentioning
confidence: 99%
“…Nanowirebased monochromic-coherent light sources may enable a number of groundbreaking applications, such as compact high resolution biochemical imaging and spectroscopy [5]. For III-nitride (GaN-based) nanowires, advances in synthesis techniques [6][7][8][9][10] have given rise to high material quality and controlled nanowire geometries needed for lasing [11]. Moreover, increasing efforts have been dedicated recently to manipulating the fundamental lasing properties of these nanowire lasers to make them more suitable for practical applications.…”
Section: Introductionmentioning
confidence: 99%