Gas dynamics and film profiles in pulsed-laser deposition of materials

Анисимов, С. И.; Bäuerle, D.; Luk’yanchuk, Boris

doi:10.1103/physrevb.48.12076

Cited by 304 publications

(207 citation statements)

References 5 publications

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“…At 600 ns, in the absence of the magnetic field, the ablation plume is approximately semi-ellipsoidal in shape, in agreement with the adiabatic and isentropic model of plume expansion. 13,16 The leading edge of the plume has just reached the coil which is in accordance with the ion signal in Fig. 2(a).…”

supporting

confidence: 66%

“…Fitting the deposition profile yields a value of $2.3 for the aspect ratio of the ablation plume. 16 Using this value, and the deposition rate of 2 Â 10 À3 nm per laser shot in the center of the profile, gives a value of $7.5 Â 10 13 for the number of atoms deposited per pulse, 13,16 if the plume was not skimmed by the coil aperture. The deposition with the field (Fig.…”

Section: Fig 2 (A)mentioning

confidence: 99%

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Heating and compression of a laser produced plasma in a pulsed magnetic field

Creel

Donnelly

Lunney

2016

Applied Physics Letters

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A pulsed 0.3 T magnetic field was used to heat and compress a low-temperature laser produced copper plasma. The magnetic field was generated using a planar 3-turn coil positioned 10 mm above the ablation spot. The plasma flowing through a central aperture in the coil was strongly focused. Inductive heating of the plasma caused a large enhancement of the overall visible light emission and the appearance of Cu II line emission. The plasma focusing is also evident in the constriction of the spatial distribution of deposited copper. The plasma heating and focusing can be explained in the framework of resistive magnetohydrodynamics.

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supporting

confidence: 66%

Section: Fig 2 (A)mentioning

confidence: 99%

Heating and compression of a laser produced plasma in a pulsed magnetic field

Creel

Donnelly

Lunney

2016

Applied Physics Letters

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“…We have analyzed the results in terms of two existing models for an adiabatic expansion by Anisimov et al 16,22 and Singh and Narayan. 17 While the equations of motion for the plume are similar in the two models, the latter authors have assumed that the spatial temperature gradients are zero, even though there is no mechanism of sustaining a finite temperature at the outer edge of the plume during the free expansion.…”

Section: Plume Dynamicsmentioning

confidence: 99%

“…Actually there are three plume characteristics reflecting the initial shape of the plasma plume. 10,16,17 These are ͑a͒ the strongly peaked angular distribution of ablated atoms perpendicular to the surface, ͑b͒ the flip-over effect of the plume, and ͑c͒ the broadening of the angular distribution with decreasing laser beam spot. The first effect, the forward peaked distribution, is well known.…”

Section: Plume Dynamicsmentioning

confidence: 99%

“…The subsequent adiabatic expansion of the ablation plume in stage ͑iii͒ is largely determined by the shape of the plume at the end of the laser pulse. 14,16,17,22 The initial formation of the plume in stage ͑i͒ and ͑ii͒ is a complex process, which may involve vaporization and phase explosion. [23][24][25] For the emission of neutrals during ablation the evolution of the plume can be characterized by the formation of a Knudsen layer, 4 over which the velocity distributions change from a half-space to a full three-dimensional distribution.…”

Section: Introductionmentioning

confidence: 99%

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Dynamics of the plume produced by nanosecond ultraviolet laser ablation of metals

2003

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The dynamics of the ablation plume of a partially ionized plasma produced by a nanosecond UV laser with different irradiation spot geometries has been explored. We have used an ensemble of quartz crystal microbalances to make the first systematic and quantitative study of how the shape of the plume varies as the aspect ratio (b/a) of the elliptical laser spot is varied by about a factor of ten. The flip-over effect can be described by the adiabatic expansion model of Anisimov et al. using a value of the adiabatic constant of about ␥ ϭ1.4. We have also studied the forward peaking of the ablation plume for a large number of metals at the same laser fluence. Contrary to earlier reports, we find that the more refractory metals have the broader angular distributions.

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Thin Film Formation Techniques

Rumaiz¹,

Franklin²,

Buzby³

et al. 2006

Kirk-Othmer Encyclopedia of Chemical Technology

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A thin film is a surface layer with thickness of a few micrometers. These films have properties much different than that of bulk materials or that of the substrate on which the film is deposited. There are a variety of techniques for thin‐film deposition, generally referred to as vapor deposition processes. Depending on the source of the vapors to be deposited, vapor deposition process can be classified as physical vapor deposition (PVD) or chemical vapor deposition (CVD). Among the two, PVD technique is more widely used for thin‐film formation. Here, vapors are produced using resistive heating, atomic sputtering, ion plating, magnetron sputtering or lasers, alone or in combination with each other. Most of the PVD processes require a high vacuum. In CVD technique, vapors are obtained from gas, liquid, or solid precursors and involve a chemical reaction for the film formation.

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Gas dynamics and film profiles in pulsed-laser deposition of materials

Cited by 304 publications

References 5 publications

Heating and compression of a laser produced plasma in a pulsed magnetic field

Heating and compression of a laser produced plasma in a pulsed magnetic field

Dynamics of the plume produced by nanosecond ultraviolet laser ablation of metals

Thin Film Formation Techniques

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