Gas-phase FT-IR characterization of ion implant process effluents

Arnó, Josep; Sweeney, Joseph; Marganski, Paul; Faller, Rebecca; Roberge, S.; Dolan, M.C.

doi:10.1109/iit.2002.1258044

Cited by 2 publications

(5 citation statements)

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“…Equivalent lengths of various components can be found in [6]. 2 The pressure drop across just the Novasafe is the difference between the tests in which the unit is and is not present (for a given pump speed). the culmination of each of these objectives.…”

Section: Design Featuresmentioning

confidence: 99%

“…Depending on the type of ion implanter and the specific process recipe, the effluent concentrations of the gases listed in Table 1 can be significant. For example, typical levels of arsine and phosphine gas measured downstream on the roughing pumps range between 1 and 10 ppm [1,2]. Concentrations of boron trifluoride have been measured at levels up to 300 ppm [2].…”

Section: Introductionmentioning

confidence: 99%

“…For example, typical levels of arsine and phosphine gas measured downstream on the roughing pumps range between 1 and 10 ppm [1,2]. Concentrations of boron trifluoride have been measured at levels up to 300 ppm [2]. During the beam tuning stage, the respective concentrations are even higher [1,2].…”

Section: Introductionmentioning

confidence: 99%

“…Concentrations of boron trifluoride have been measured at levels up to 300 ppm [2]. During the beam tuning stage, the respective concentrations are even higher [1,2]. Ion implant effluent can be treated using a number of methods, including gas absorption with chemical addition (water scrubbing), thermal oxidation, or gas adsorption utilizing a reactive resin media (also known as chemisorption or dry scrubbing).…”

Section: Introductionmentioning

confidence: 99%

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orig-research

Sweeney¹,

Arno²,

Faller³

et al. 2002

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference On

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A small, zero-footprint, passive chemisorption scrubber (Novasafe) has been developed to treat the effluent from ion implanters. Extensive laboratory testing dictated a dual bed unit with a diameter of 10" and a height of 12". Evaluation in a production environment indicated that scrubber lifetime varied with implanter type. The units lasted approximately 6-9 months when servicing high current implanters, and lasted in excess of one year when servicing medium current implanters. The failure mechanism on high current implanters was due to increased pressure drop resulting from solids accumulation.

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Section: Design Featuresmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

orig-research

Sweeney¹,

Arno²,

Faller³

et al. 2002

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference On

Self Cite

View full text Add to dashboard Cite

show abstract

“…One of the major disadvantages of the BF 3 molecule is that it is very difficult to ionize (only ~15% is ionized and the rest is discarded). 1 Furthermore, under normal production conditions only ~30% of the ionized BF 3 is converted into B + ions that can be used for implantation. This results in low B + beam currents and become a cause of the following problems:…”

Section: Introductionmentioning

confidence: 99%