Gas Purification and Measurement at the PPT Level

Briesacher, Jeffrey L.; Nakamura, Masakazu; Ohmi, Tadahiro

doi:10.1149/1.2085487

Cited by 26 publications

(16 citation statements)

References 3 publications

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“…5 shows the typical very low concentration of impurities at the outlet of a getter purifier measured by a Thermo Scientific APIMS (atmospheric pressure ionization mass spectrometry) [11].…”

Section: Getter Purifiersmentioning

confidence: 99%

High Purity Hydrogen: Guidelines to Select the Most Suitable Purification Technology

Macchi¹,

Vogt²

2017

JEE

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Hydrogen is a gas widely used in a number of industrial applications. For example, in the electronic industry it is utilized to manufacture highly advanced devices like microprocessors, LEDs (light-emitting diodes) and solar cells. Hydrogen usage will be expanding as it is the main fuel for fuel cell technology and is used to store the excess energy generated by renewable sources such as solar and wind. In these applications the degree of purity of hydrogen is crucial and advanced purification systems are typically used to guarantee the purity. This article will review the types of purification technologies that are currently available to generate high purity hydrogen, starting from an already clean source that is at least 99.9% pure. Other technologies also widely used in gas purification, like PSA (pressure swing adsorption) and polymeric membrane separation, which are more suitable to handle a lower degree of hydrogen purity will not be discussed. This article will review the advantages and disadvantages of adsorbers, getters, cryogenic and palladium purification technologies with guidelines on how to select the most appropriate technology depending on the application and the experimental conditions.

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“…5 shows the typical very low concentration of impurities at the outlet of a getter purifier measured by a Thermo Scientific APIMS (atmospheric pressure ionization mass spectrometry) [11].…”

Section: Getter Purifiersmentioning

confidence: 99%

High Purity Hydrogen: Guidelines to Select the Most Suitable Purification Technology

Macchi¹,

Vogt²

2017

JEE

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“…1, a commercial room temperature metallic-alloy getter silane gas purifier ͑''MonoTorr'' from SAES Getters͒ mounted in the gas line just in front of the reactor ͑point-of-use͒ can be used in an optional mode via a bypass valve to purify the silane gas. This silane purifier with ppt ͑parts-per-trillion͒ purification efficiency 7 reduces the oxygen contamination ͑moisture, oxygen, and other oxygenated impurities͒ of the incoming silane gas in the sub-ppb range 8 by means of surface chemisorption. The above experimental conditions were used to prepare the following samples.…”

Section: ϫ3mentioning

confidence: 99%

Origins of atmospheric contamination in amorphous silicon prepared by very high frequency (70 MHz) glow discharge

Kroll

Meier

Keppner

et al. 1995

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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The authors have studied the effect of plasma power, reactor outgassing rates, and of silane purity on the oxygen, carbon, and nitrogen contents of amorphous silicon material prepared by the very high frequency ͑70 MHz͒ glow discharge technique. The silane purity could be optionally enhanced by the application of a getter-based silane gas purifier. It was found that oxygen incorporation was enhanced at lower deposition rates, whereas the nitrogen and carbon film contamination were unaffected. The deposition rate dependence of the incorporation is in excellent agreement with a proposed model. Apart from the effects of plasma power on the incorporation probability, the reactor outgassing rate and the purity of the silane gas itself were identified as the main contamination sources for the atmospheric contaminants in the deposited films. At the low outgassing rate, at least around one-half of the oxygen detected in the a-Si:H material originates from the silane gas. Due to the reduced outgassing rate and an enhanced purity of the silane gas used, the authors have deposited a-Si:H-material with the lowest concentrations of atmospheric contaminants reported to date. Furthermore, the present results exclude a contamination of the a-Si:H-material by a postoxidation after air exposure.

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“…Mass spectrometry is well established as a process analysis technique, with examples reported for the analysis of gaseous or volatile samples across a range of industries such as fermentation, 1 iron and steel, [2][3][4] semiconductor, 5,6 petrochemical 2, 4, 7 and chemical. 2,8 Quadrupole or magnetic sectors instruments are typically used with electron ionisation.…”

Section: Introductionmentioning

confidence: 99%

On-line detection and quantification of trace impurities in vaporisable samples by direct liquid introduction process mass spectrometry

et al. 2014

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Gas Purification and Measurement at the PPT Level

Cited by 26 publications

References 3 publications

High Purity Hydrogen: Guidelines to Select the Most Suitable Purification Technology

High Purity Hydrogen: Guidelines to Select the Most Suitable Purification Technology

Origins of atmospheric contamination in amorphous silicon prepared by very high frequency (70 MHz) glow discharge

On-line detection and quantification of trace impurities in vaporisable samples by direct liquid introduction process mass spectrometry

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