Third NREL Conference on Thermophotovoltaic Generation of Electricity 1997
DOI: 10.1063/1.53277
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GaSb based ternary and quaternary diffused junction devices for TPV applications

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Cited by 7 publications
(2 citation statements)
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“…Table 1 provides a summary of characteristics, advantages and disadvantages for different types of TPV cell growth methods. [52,62,111] Less precise [113] Ion implantation n/a Not suitable 80-373 K [115] 300-1000 Torr [116] Ionized radiation…”
Section: Tpv Cell Fabricationmentioning
confidence: 99%
“…Table 1 provides a summary of characteristics, advantages and disadvantages for different types of TPV cell growth methods. [52,62,111] Less precise [113] Ion implantation n/a Not suitable 80-373 K [115] 300-1000 Torr [116] Ionized radiation…”
Section: Tpv Cell Fabricationmentioning
confidence: 99%
“…Zinc-diffused junctions represent an alternative to the more complicated double heterostructures made by MOCVD, LPE and MBE [43][44][45][46][47][48][49]. Using a pseudo-closed box diffusion process in combination with controlled anodic oxidation and etching, an optimum emitter doping profile can be obtained.…”
Section: Diffused P-n Junctions For Gasb-related Tpv Applicationsmentioning
confidence: 99%