2015 IEEE International Electron Devices Meeting (IEDM) 2015
DOI: 10.1109/iedm.2015.7409775
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Gate-first high-k/metal gate DRAM technology for low power and high performance products

Abstract: It is the first time that the high-k/metal gate technology was used at peripheral transistors for fully integrated and functioning DRAM. For cost effective DRAM technology, capping nitride spacer was used on cell bit-line scheme, and single work function metal gate was employed without strain technology. The threshold voltage was controlled by using single TiN metal gate with La 2 O 3 and SiGe/Si epi technology. The optimized DRAM high-k/metal gate peripheral transistors showed current gains of 65%/55% and DIB… Show more

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Cited by 17 publications
(2 citation statements)
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“…12,13) Therefore, Gate First integration seems more suitable for Memory application, and its feasibility has been proved by different teams. [14][15][16] After the planar HKMG, the next generation DRAM memories will require additional power-performance-areacost benefit, forcing the transition to a FinFET based platform offering additional power and performance benefit without adding significant cost. 17) In this work we have investigated the fabrication of FinFET devices specifically tailored for memory application, by extending the finding shown in Ref.…”
Section: Introductionmentioning
confidence: 99%
“…12,13) Therefore, Gate First integration seems more suitable for Memory application, and its feasibility has been proved by different teams. [14][15][16] After the planar HKMG, the next generation DRAM memories will require additional power-performance-areacost benefit, forcing the transition to a FinFET based platform offering additional power and performance benefit without adding significant cost. 17) In this work we have investigated the fabrication of FinFET devices specifically tailored for memory application, by extending the finding shown in Ref.…”
Section: Introductionmentioning
confidence: 99%
“…For the memory side, the scaling of device footprint enabled a higher memory density ( Hwang, 2002 ). However, extensive scaling led to many challenges, which were overcome by the memory industry with process innovations such as higher aspect ratio of DRAM, and material innovations like high-k materials ( Mueller et al, 2005 ; Sung et al, 2015 ; Jang et al, 2019 ). For the interconnect side, the transistor scaling has been also a key enabler for a higher bandwidth, because a faster transistor makes a circuit faster ( Daly, Fujino & Smith, 2018 ; Horowitz, Yang & Sidiropoulos, 1998 ).…”
Section: Introductionmentioning
confidence: 99%