2017
DOI: 10.1063/1.4977834
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Gate-tunable, normally-on to normally-off memristance transition in patterned LaAlO3/SrTiO3 interfaces

Abstract: We report gate-tunable memristive switching in patterned LaAlO3/SrTiO3 interfaces at cryogenic temperatures. The application of voltages in the order of a few volts to the back gate of the device allows controlling and switching on and -off the inherent memory functionality (memristance). For large and small gate voltages a simple non-linear resistance characteristic is observed while a pinched hysteresis loop and memristive switching occurs in an intermediate voltage range. The memristance is further controll… Show more

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Cited by 8 publications
(2 citation statements)
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“…[20] For most of the oxides, especially perovskite oxides like strontium titanite, resistive switching is usually related to OVs. [21][22][23][24] However, it is complex to distinguish whether the immigration of OVs, trapping and detrapping of carriers, or carrier hopping between OVs play a key role in resistive switching. It is desirable to study the conduction mechanism of the oxides memristors by controlling parameters like the concentration of OVs and carriers.…”
Section: Introductionmentioning
confidence: 99%
“…[20] For most of the oxides, especially perovskite oxides like strontium titanite, resistive switching is usually related to OVs. [21][22][23][24] However, it is complex to distinguish whether the immigration of OVs, trapping and detrapping of carriers, or carrier hopping between OVs play a key role in resistive switching. It is desirable to study the conduction mechanism of the oxides memristors by controlling parameters like the concentration of OVs and carriers.…”
Section: Introductionmentioning
confidence: 99%
“…[3][4][5][6]. These materials and the LAO/STO 2DES in particular are a fascinating wellspring for novel functionalities, for example in memresistive devices [7]. However, heterostructuring with epitaxial LAO layers is not the only way to create a 2DES in STO.…”
Section: Introductionmentioning
confidence: 99%