Advances in manufacturing process technology are key ensembles for the production of integrated circuits in the sub-micrometer region. It is of paramount importance to assess the effects of tolerances in the manufacturing process on the performance of modern integrated circuits. The polynomial chaos expansion has emerged as a suitable alternative to standard Monte Carlo-based methods that are accurate, but computationally cumbersome. This paper provides an overview of the most recent developments and challenges in the application of polynomial chaos-based techniques for uncertainty quantification in integrated circuits, with particular focus on high-dimensional problems.