Generation and evolution of residual stresses in physical vapour-deposited thin films

Pauleau, Y.

doi:10.1016/s0042-207x(00)00475-9

Cited by 124 publications

(49 citation statements)

References 17 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…energetic ions can be used for this purpose since they can trigger surface and bulk diffusion processes, 1,102 induce changes in the film structure and chemical composition, 103 and cause generation of internal stresses. [104][105][106][107] The high fluxes of ionized material available in HiPIMS have been found to allow for control of the phase formation in both elemental and compound films. One example is the control of the phase composition in Ta films.…”

Section: B Phase Composition Tailoring By Hipimsmentioning

confidence: 99%

An introduction to thin film processing using high-power impulse magnetron sputtering

2012

View full text Add to dashboard Cite

High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized physical vapor deposition technique and is already making its way to industrial applications. The major difference between HiPIMS and conventional magnetron sputtering processes is the mode of operation. In HiPIMS the power is applied to the magnetron (target) in unipolar pulses at a low duty factor (andlt;10%) and low frequency (andlt;10 kHz) leading to peak target power densities of the order of several kilowatts per square centimeter while keeping the average target power density low enough to avoid magnetron overheating and target melting. These conditions result in the generation of a highly dense plasma discharge, where a large fraction of the sputtered material is ionized and thereby providing new and added means for the synthesis of tailor-made thin films. In this review, the features distinguishing HiPIMS from other deposition methods will be addressed in detail along with how they influence the deposition conditions, such as the plasma parameters and the sputtered material, as well as the resulting thin film properties, such as microstructure, phase formation, and chemical composition. General trends will be established in conjunction to industrially relevant material systems to present this emerging technology to the interested reader.Funding Agencies|Swedish Research Council (VR)|623-2009-7348

show abstract

Section: B Phase Composition Tailoring By Hipimsmentioning

confidence: 99%

An introduction to thin film processing using high-power impulse magnetron sputtering

2012

View full text Add to dashboard Cite

show abstract

“…Four kinds of YSZ thin films were deposited at the same temperature, so the thermal stresses of all the thin films were presumed to be the same. The thermal stress for thin films was tensile and the value was about 202 MPa through Hooke's law [25]. Thus the thermal stress is not the dominant factor on the all residual stress, which is only a small fraction of the residual stress.…”

Section: Residual Stressmentioning

confidence: 98%

Y2O3 stabilized ZrO2 thin films deposited by electron-beam evaporation: Optical properties, structure and residual stresses

Xiao

Shao

et al. 2008

Vacuum

View full text Add to dashboard Cite

“…The core is identical as in the case of the type 1 system. The physical and mathematical model that makes it possible to determine the internal thermal stresses was developed based on the [18][19][20][21][22][23][24] and classical theory of elastic-plastic materials [25]. The details of the design of the computer model used based on an FEM analysis are contained in the studies [13,26] and in the documentation of the Comsol package, with the aid of which the calculations were made.…”

Section: Computer Modelmentioning

confidence: 99%

“…For the purpose of computer designing and testing of the properties of coatings, simulation packages are used. They are based on the finite element method (FEM), and they make it possible to determine the state of internal stresses and strains in substrate/coating systems, which occur as a result of external thermomechanical loads [18][19][20][21][22][23][24][25]. This offers a possibility to conduct virtual in-service tests that support the selection of the optimal physico-chemical parameters and the geometry of anti-wear coatings [26][27][28].…”

Section: Introductionmentioning

confidence: 99%

Application of dilatometry with modulated temperature for thermomechanical analysis of anti-wear coating/substrate systems

Myśliński

Szparaga

Kamasa

et al. 2015

J Therm Anal Calorim

View full text Add to dashboard Cite

Modern vacuum-plasma surface modification technologies of tools for metal and wood machining are based inter alia on the deposition of thin gradient and multilayer protection coatings with a thickness of several micrometers. Exploitation of tools are frequently carried out in complex tribological nodes, where next to mechanical loads, there are significant changes in temperature at the interface of the tool/workpiece material; hence, the knowledge of the thermomechanical stability of the coatings operating under these conditions is an important criterion used in the processes of designing of wear-resistant coating technology. In this paper, the objects of research were three types of gradient PVD coating/molybdenum substrate systems, for which time courses of amplitudes of elongation and equivalent thermal expansion coefficients of the systems were measured. Experimental measurements were made using a temperature-modulated dilatometry using concepts of dynamic load thermomechanical analysis. It was demonstrated that the developed method allows a quantitative determination of the influence of the gradient layer type on the total elongation of the substrate of the system. It was also shown that the changes of thermomechanical properties of the systems during annealing process are correlated with the time evolution of the equivalent thermal expansion coefficient. In addition, using the concepts of transition function describing the continuous change of physical and chemical parameters as a function of the spatial variables and finite element method for each of the systems, the distributions of internal thermal stresses were determined.

show abstract

Generation and evolution of residual stresses in physical vapour-deposited thin films

Cited by 124 publications

References 17 publications

An introduction to thin film processing using high-power impulse magnetron sputtering

An introduction to thin film processing using high-power impulse magnetron sputtering

Y2O3 stabilized ZrO2 thin films deposited by electron-beam evaporation: Optical properties, structure and residual stresses

Application of dilatometry with modulated temperature for thermomechanical analysis of anti-wear coating/substrate systems

Contact Info

Product

Resources

About