Generation of Double Pulses in the Extreme Ultraviolet Spectral Range Using a Laser Combined Pinch Plasma Source

Abstract

The interaction of a dense plasma with short laser pulses (ns) is investigated. The dense plasma is created using a low-current hollow-cathode-triggered discharge. This configuration generates a dense plasma with an electron density of ne 10 17 cm 3. Spectra are taken in the extreme ultraviolet (EUV) spectral range from11-18 nm to estimate the temperature. The interaction between plasma and laser beam as a longitudinally pumped light source is discussed. The required properties of the plasma, according to the radial profiles of the temperature and the density, are exemplified. It is shown, that the generation of double pulses in the extrem ultraviolet spectral range is possible by reheating the residuals of an expanding dense plasma with a short laser pulse.

High brightness electrodeless Z-Pinch EUV source for mask inspection tools

“…The fundamental idea of heating a plasma with a laser , even as a lithography source is not at all new [10], nor [11,12] is application of the basic idea to an EUV source. We believe the stability of the target plasma produced by the electrodeless pinch, however, is uniquely suited to this approach.…”