1996
DOI: 10.1117/12.262736
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Generation of picosecond far-infrared pulses using laser-activated semiconductor reflection switches

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Cited by 17 publications
(3 citation statements)
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“…This is a very different mode of operation to that used in other high-power pulsed EPR spectrometers, where pulse sequences are generated at low power and then amplified. The shutters are high-purity Si wafers with thicknesses carefully polished down to 1/2 wavelength 24,25 . In our 'pulse slicer' (see Fig.…”
mentioning
confidence: 99%
“…This is a very different mode of operation to that used in other high-power pulsed EPR spectrometers, where pulse sequences are generated at low power and then amplified. The shutters are high-purity Si wafers with thicknesses carefully polished down to 1/2 wavelength 24,25 . In our 'pulse slicer' (see Fig.…”
mentioning
confidence: 99%
“…This is a very different mode of operation than is used in other high-power pulsed EPR spectrometers, where pulse sequences are generated at low power and then amplified. The shutters are high-purity Si wafers with thicknesses carefully polished down to 1/2 wavelength [28,29]. In our "pulse slicer" (see Fig.…”
mentioning
confidence: 99%
“…The short pulses are extracted from the high-intensity longpulse output of the UCSB FEL with laser-activated semiconductor switches. 15,16 The switches are manufactured from silicon and are activated by illumination with nearinfrared radiation across the band gap, which generates a reflecting electron-hole plasma. 17 Step-function-like activation of the switches is obtained with a very short (∼150 fs), intense (>1 mJ per switch) near-infrared pulse.…”
mentioning
confidence: 99%