1994
DOI: 10.1103/physrevlett.72.2793
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Generation of very slow polarized positive muons

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Cited by 167 publications
(120 citation statements)
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“…energy spread) while conserving the initial full polarization 32 . The epithermal muons are extracted (by applying up to +20 kV to the moderator substrate), transported and focused by electrostatic elements to the sample.…”
Section: Methodsmentioning
confidence: 99%
“…energy spread) while conserving the initial full polarization 32 . The epithermal muons are extracted (by applying up to +20 kV to the moderator substrate), transported and focused by electrostatic elements to the sample.…”
Section: Methodsmentioning
confidence: 99%
“…Unlike conventional µSR techniques which make use of the energetic muons (∼ 4 MeV) originating from π + decay at rest ("surface" muons), LE-µSR makes use of epithermal muons (∼ 15 eV) extracted after moderation of surface muons from a thin film of a weakly bound van der Waals cryosolid (wide band gap insulator) 21,22 . By re-accelerating the epithermal muons up to 20 keV and biasing the sample, it is possible to tune the implantation energy in the range of 0.5 to 30 keV and thus to implant the muons beneath the surface of any material in a range of up to about 300 nm and a spatial resolution down to 1 nm.…”
Section: Methodsmentioning
confidence: 99%
“…A low-energy µ + beam with tunable energy in the keV regime [2] plays an important role in the µSR field because these muons can be used to investigate thin films. The Low Energy Muon (LEM) beam line at PSI shown in figure 1 is delivering µ + with tunable kinetic energy between 0.5 and 30 keV allowing the study of thin films and multilayers as a function of the implantation depth ranging from 0.5 nm to a few hundred nm [3,4].…”
Section: Introductionmentioning
confidence: 99%