Generic Substrate for the Surface Forces Apparatus:  Deposition and Characterization of Silicon Nitride Surfaces

Golan, Yuval; Alcantar, Norma; Kuhl, and Tonya L.; Israelachvili, Jacob N.

doi:10.1021/la000125h

Cited by 15 publications

(6 citation statements)

References 27 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Using SFA interferometry with the pin-on-disk geometry would require this more stringent alignment, along with preparation of a smooth spherical surface as described elsewhere [19][20][21][22]. In addition, an optically appropriate annulus on the flat disk would be required along the sliding path, which could be opaque and reflecting for reflected beam interferometry [23].…”

Section: Use Of Rotating Disk In Sfamentioning

confidence: 99%

High-Speed Friction Measurements Using a Modified Surface Forces Apparatus

et al. 2011

View full text Add to dashboard Cite

Methods of measuring friction forces in the surface forces apparatus (SFA) are presented for sliding velocities from \1 nm/s to [10 m/s. A feed-forward control (FFC) system for the piezoelectric bimorph slider attachment is introduced to allow experiments at velocities up to *4 mm/s. For still higher speeds, a motor-driven rotating mini-disk setup using a pin-on-disk geometry is presented, with modifications to enable sliding velocities in the ranges 1 cm/s-5 m/s and 1-25 m/s. Example data sets demonstrate the applicability of the approach to modeling important tribological systems including hard-disk drives. We find that mechanical system parameters such as the resonant frequencies and mutual alignments of different moving parts become increasingly important in determining the tribological response at sliding velocities above *1 cm/s (for SFA or bench top devices). Smooth or stick-slip sliding-common features of low-speed sliding-become replaced by large-amplitude oscillatory responses that depend on the load and especially the driving speed or rotational/reciprocating frequencies.Detailed recordings and modeling of these complex effects are necessary for fully understanding and controlling frictional behavior at high speeds.

show abstract

Section: Use Of Rotating Disk In Sfamentioning

confidence: 99%

High-Speed Friction Measurements Using a Modified Surface Forces Apparatus

et al. 2011

View full text Add to dashboard Cite

show abstract

“…Thin silicon nitride (Si 3 N 4 ) films are widely used for gate spacers and diffusion barriers in the microelectronics industry. − Typically, Si 3 N 4 films are grown by low-pressure chemical vapor deposition (LPCVD) at high temperatures (750 °C) or by plasma-enhanced chemical vapor deposition (PECVD) at lower temperatures. − However, as devices continue to scale down, the requirements for conformality and step-coverage are becoming more stringent, making CVD-based processes inadequate . In contrast, atomic layer deposition (ALD) is a technique based on self-limiting surface reactions, which allows for the growth of high quality, highly conformal thin films on both planar and 3-D (e.g., trenches, nanorods, nanoparticles, etc.)…”

Section: Introductionmentioning

confidence: 99%

Role of Trimethylaluminum in Low Temperature Atomic Layer Deposition of Silicon Nitride

et al. 2017

View full text Add to dashboard Cite

Aminosilanes are attractive precursors for atomic layer deposition of silicon oxides and nitrides because they are halide-free and more reactive than chlorosilanes. However, the deposition of silicon nitride on oxide substrates still requires relatively high temperatures. We show here that for a process involving disec-butylaminosilane and hydrazine, the insertion of Al from trimethyl aluminum allows the deposition of silicon nitride films at relatively low temperatures (250 °C). Firstprinciples calculations reveal that the presence of Al increases the binding of molecular hydrazine, thereby effectively enhancing the reactivity of hydrazine with the silicon precursor during the atomic layer deposition process, which leads to nitrogen incorporation into silicon. However, the range of this enhancement is limited to ∼1 nm, requiring additional trimethylaluminum exposures to continue the Si 3 N 4 deposition.

show abstract

“…In an effort to explore materials other than mica in the SFA, a number of modifications to the instrument have been devised. These include: Coating the mica with a thin layer of another material; [5][6][7][8][9][10][11] preparing other transparent materials to replace the mica; [12][13][14] and substituting the optical thickness measurement with a nonoptical technique. The last approach has resulted in hybrid instruments, like the MASIF 15 and those developed by Tonck et al 16 and Salmeron et al, 17 that have capabilities that lie between the SFA and the other important force measurement alternative, the atomic force microscope ͑AFM͒.…”

Section: Introductionmentioning

confidence: 99%

Extending the surface force apparatus capabilities by using white light interferometry in reflection

Connor

Horn

2003

Review of Scientific Instruments

View full text Add to dashboard Cite

An important factor in the success of the surface force apparatus ͑SFA͒ in measuring interactions between surfaces over nanometer separations has been the optical interference technique used to measure the surface separation. Until recently, this technique has only been used when both of the materials are transparent. As a result, thin sheets of mica have been the material of choice. We describe a simple method to extend the capabilities of the SFA so that a wide variety of material surfaces can be studied while retaining an optical measurement technique. The key to this technique is to modify the optics so that reflected, rather than transmitted, light is used to produce the interference pattern. Now, only one material is required to be thin and transparent while the other can be any material providing it is at least partially reflective. To succeed with this technique, it is necessary to maximize the visibility of the interference fringes. This is achieved by optimizing the thickness of a partially reflective coating ͑often silver͒ deposited on the back side of the transparent material.

show abstract

Generic Substrate for the Surface Forces Apparatus: Deposition and Characterization of Silicon Nitride Surfaces

Cited by 15 publications

References 27 publications

High-Speed Friction Measurements Using a Modified Surface Forces Apparatus

High-Speed Friction Measurements Using a Modified Surface Forces Apparatus

Role of Trimethylaluminum in Low Temperature Atomic Layer Deposition of Silicon Nitride

Extending the surface force apparatus capabilities by using white light interferometry in reflection

Contact Info

Product

Resources

About