1977
DOI: 10.1016/0020-0891(77)90106-3
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Geometrical enhancement of HgCdTe photoconductive detectors

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Cited by 41 publications
(8 citation statements)
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“…The basic idea of the overlap structure is to increase the effective lifetime of the excess carriers by providing a longer path along which they must drift or diffuse to reach the high recombination region at the contacts. At high bias fields, where drift is dominant over diffusion, it is clear that an enhancement of the effective lifetime is achieved for a fixed detector length [2][3][4].…”
Section: Theorymentioning
confidence: 99%
See 1 more Smart Citation
“…The basic idea of the overlap structure is to increase the effective lifetime of the excess carriers by providing a longer path along which they must drift or diffuse to reach the high recombination region at the contacts. At high bias fields, where drift is dominant over diffusion, it is clear that an enhancement of the effective lifetime is achieved for a fixed detector length [2][3][4].…”
Section: Theorymentioning
confidence: 99%
“…Due to the ever-increasing demands of higher resolution (necessitating smaller-sized detectors), the problem becomes severe when the detector length approaches drift length, and severely degrades the minority carrier lifetime (τ ). The solution to this problem was originally proposed by Kinch et al [2].…”
Section: Introductionmentioning
confidence: 99%
“…The basic idea of overlap structure is to increase the effective lifetime of excess carriers by providing a longer path along which they must drift or diffuse to reach the high recombination region at the contacts. At high bias fields where drift is dominant over diffusion, it is clear that enhancement of effective lifetime is achieved for a fixed detector length [2][3][4].…”
Section: Detector: Overlap Structure Modelmentioning
confidence: 97%
“…The advantages of modified photoconductive (PC) detector structure called ''overlap structure'' are well known and discussed by several authors [1][2][3][4]. However, none of these authors included the contribution of shunt resistance due to passivantsemiconductor interface in their analysis.…”
Section: Introductionmentioning
confidence: 99%
“…Pixels with sensitive area size W×∆L = 50×50 µ m were either standard quadrant with length of semiconductor slab along bias current path equals to L = ∆ L = 50 µ m or with "shadowing" shield ( Fig. 4B) eliminating "sweep-out" effect of minority charge carriers 16,17 and with length of semiconductor slab along bias current path equals to L = 140 µ m. Devices were tested for spectral response, I-V curve, responsivity R V and low-frequency noise spectral density (NSD) at different background flux density (T bgr ≈ 300 K) at T op ≈ 290 -300 K and 78 K. Excess charge carriers were excited in sensitive structure by illumination through front graded-gap adjacent layer (Fig. 3).…”
Section: Metering Set-upmentioning
confidence: 99%