Geometrical Phase Optical Components: Measuring Geometric Phase without Interferometry

Abstract

Optical components that are based on Pancharatnam–Berry phase feature a polarization-dependent diffraction that can be used to fabricate lenses and gratings with unique properties. In recent years, the great progress made in the fabrication of the metasurfaces that are required for these optical components has lowered their cost and has made them widely available. One of the often-overlooked properties of optical components based on geometrical phases (GPs) is that, contrary to dynamical phases, their phase can be measured while using a polarimetric technique without the need to resort to interferometry methods. This is possible because the Pancharatnam–Berry phase is not controlled by an optical path difference; it results from a space variant polarization manipulation. In this work, we apply Mueller matrix microscopy in order to measure the geometrical phase of GP lenses and polarization gratings. We show that a single space resolved Mueller matrix measurement with micrometric resolution is enough to obtain a full characterization phase-profile of these GP-based optical components and evaluate their performance.

Mueller matrix imaging polarimeter with polarization camera self-calibration applied to structured light components

“…Research in patterned polarization elements and research in polarimetric imaging are closely related [17]. While patterned polarization elements are providing new tools for advanced polarization imaging [18,19], polarimetric imaging relying on the Mueller matrix has proven very worthy to evaluate the quality of the fabricated components [20,21]. Although Mueller matrix imaging polarimetry has been employed for almost three decades [22], it is a technique in constant evolution, where multiple variants have been introduced over the years [23,24].…”

Complete Mueller matrix imaging polarimeter for evaluating optical components for structured light

“…Research related to patterned polarization elements and to polarimetric imaging features a dual sense. While patterned polarization elements are providing new tools for advanced polarization imaging [5], polarimetric imaging is also very valuable to evaluate the quality of the fabricated components [6]. In this context, we present the advances in the realization of an automatic Mueller matrix imaging polarimeter designed to evaluate patterned polarization elements.…”