Nanoscale devices that utilize oxygen
vacancies in two-dimensional
metal-oxide structures garner much attention due to conductive, magnetic,
and even superconductive functionalities they exhibit. Ferroelectric
domain walls have been a prominent recent example because they serve
as a hub for topological defects and hence are attractive for next-generation
data technologies. However, owing to the light weight of oxygen atoms
and localized effects of their vacancies, the atomic-scale electrical
and mechanical influence of individual oxygen vacancies has remained
elusive. Here, stable individual oxygen vacancies were engineered
in situ
at domain walls of seminal titanate perovskite ferroics.
The atomic-scale electric-field, charge, dipole-moment, and strain
distribution around these vacancies were characterized by combining
advanced transmission electron microscopy and first-principle methodologies.
The engineered vacancies were used to form quasi-linear quadrupole
topological defects. Significant intraband states were found in the
unit cell of the engineered vacancies, proposing a meaningful domain-wall
conductivity for miniaturized data-storage applications. Reduction
of the Ti ion as well as enhanced charging and electric-field concentration
were demonstrated near the vacancy. A 3–5% tensile strain was
observed at the immediate surrounding unit cells of the vacancies.
Engineering individual oxygen vacancies and topological solitons thus
offers a platform for predetermining both atomic-scale and global
functional properties of device miniaturization in metal oxides.