2022
DOI: 10.1007/s00339-022-06124-5
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Glancing angle sputter deposited tungsten trioxide (WO3) thin films for electrochromic applications

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Cited by 13 publications
(1 citation statement)
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“…The fabrication of WO 3 films for EC applications is achieved through various techniques including magnetron sputtering [ 20 , 21 , 22 , 23 , 24 ], thermal and electron beam evaporation [ 25 , 26 , 27 , 28 , 29 ], chemical vapor deposition (CVD) [ 30 , 31 ], sol-gel processes [ 32 , 33 , 34 , 35 ], and hydrothermal reactions [ 36 , 37 , 38 , 39 , 40 , 41 , 42 ]. Each method presents its own set of challenges regarding production costs, experimental conditions, and scalability.…”
Section: Introductionmentioning
confidence: 99%
“…The fabrication of WO 3 films for EC applications is achieved through various techniques including magnetron sputtering [ 20 , 21 , 22 , 23 , 24 ], thermal and electron beam evaporation [ 25 , 26 , 27 , 28 , 29 ], chemical vapor deposition (CVD) [ 30 , 31 ], sol-gel processes [ 32 , 33 , 34 , 35 ], and hydrothermal reactions [ 36 , 37 , 38 , 39 , 40 , 41 , 42 ]. Each method presents its own set of challenges regarding production costs, experimental conditions, and scalability.…”
Section: Introductionmentioning
confidence: 99%