Glass-assisted CVD growth of large-area MoS2, WS2 and MoSe2 monolayers on Si/SiO2 substrate

Özküçük, Gonca Uslu; Odaci, Cem; Şahin, E.; Ay, F.; Perkgöz, Nihan Kosku

doi:10.1016/j.mssp.2019.104679

Cited by 34 publications

(18 citation statements)

References 34 publications

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“…In this process, a thin sheet of soda lime glass was used as a catalyst to promote monolayer MoS 2 growth, which is consistent with previous studies. [ 48,49 ] Our process is optimized for six substrates, three of which are SiO 2 /Si substrates and the other three are glasses. One of the silica substrates has a patterned surface, while the other two are used as flat SiO 2 /Si substrates.…”

Section: Resultsmentioning

confidence: 99%

“…[ 51 ] It was also reported that the use of glass as a catalyst eliminates the transfer process and prevents transfer‐related contamination and deterioration of flakes. [ 48 ] In this study, 2D triangular‐shaped MoS 2 flakes were grown both on bare and patterned SiO 2 surfaces. Bare SiO 2 /Si substrate was used as reference (control group), while patterned SiO 2 /Si substrates which consist of square SiO 2 islands with the separation distances of 10 and 20 μm were employed to investigate the effects on MoS 2 flake size and distribution as well as location control across the substrate.…”

Section: Resultsmentioning

confidence: 99%

“…[ 62 ] Özküçük et al observed enhanced Raman and PL intensities of the as‐grown monolayer MoS 2 grown using a glass with higher sodium concentration when compared with the one with lower amount of sodium inclusion. [ 48 ] They also showed that the increase in sodium content resulted in more uniform flakes without additional Raman peak formations. In our study, we did not observe additional peaks in the Raman spectra, which indicates that the soda lime components may not be the reason for the enhanced PL intensities on the valley regions.…”

Section: Resultsmentioning

confidence: 99%

See 2 more Smart Citations

Glass‐Assisted Chemical Vapor Deposition‐Grown Monolayer MoS₂: Effective Control of Size Distribution via Surface Patterning

Aras

Avad

Yeltik

2022

Physica Status Solidi (a)

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Transition metal dichalcogenides (TMDs) are of interest for next‐generation electronics and optoelectronics owing to their unique optical and electronic functionalities. Although atomically thin flat TMD layers have been investigated in various device applications, pattern‐mediated growth serves great promise for revealing novel properties and application opportunities of TMDs. Herein, controlled size distribution of CVD‐grown monolayer MoS2 flakes by varying the distance between surface pattern features and the effects of patterning on the optical properties of MoS2 domains is reported. Larger flakes and higher uniformity in size distribution are obtained via patterning in comparison with the results from bare surface. Superior photoluminescence (PL) performances are observed for the 2D MoS2 grown on the pattern valleys when compared with the sample on the hill regions and the bare surface. The results demonstrate the notable potential of 2D TMDs for applications in electronics and optoelectronics.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

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Glass‐Assisted Chemical Vapor Deposition‐Grown Monolayer MoS₂: Effective Control of Size Distribution via Surface Patterning

Aras

Avad

Yeltik

2022

Physica Status Solidi (a)

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“…Özküçük et al . proposed that the reason why the glass has a catalytic effect is due to the Na + inside, not the glass surface [ 127 ]. Therefore, the glass can only act as a catalyst during the growth of the TMDCs materials, and the film should still be grown on a hydrophobic substrate.…”

Section: Growth Of the Wafer-scale Mos 2 Filmmentioning

confidence: 99%

Emerging MoS2 Wafer-Scale Technique for Integrated Circuits

Tan

Huang

et al. 2023

Nano-Micro Lett.

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As an outstanding representative of layered materials, molybdenum disulfide (MoS2) has excellent physical properties, such as high carrier mobility, stability, and abundance on earth. Moreover, its reasonable band gap and microelectronic compatible fabrication characteristics makes it the most promising candidate in future advanced integrated circuits such as logical electronics, flexible electronics, and focal-plane photodetector. However, to realize the all-aspects application of MoS2, the research on obtaining high-quality and large-area films need to be continuously explored to promote its industrialization. Although the MoS2 grain size has already improved from several micrometers to sub-millimeters, the high-quality growth of wafer-scale MoS2 is still of great challenge. Herein, this review mainly focuses on the evolution of MoS2 by including chemical vapor deposition, metal–organic chemical vapor deposition, physical vapor deposition, and thermal conversion technology methods. The state-of-the-art research on the growth and optimization mechanism, including nucleation, orientation, grain, and defect engineering, is systematically summarized. Then, this review summarizes the wafer-scale application of MoS2 in a transistor, inverter, electronics, and photodetectors. Finally, the current challenges and future perspectives are outlined for the wafer-scale growth and application of MoS2.

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“…CVD method for single‐crystalline quality TMD fabrication does not require vacuum for most materials, though some of them need in such condition. [ 44 ] Still, methods like CVD and epitaxial growth are costly, and complex that need sensitive conditions like high vacuum and high temperature and most important necessity of an extra transfer stage for the transference of 2D material from the metal surfaces toward the directed substrate. These conditions make bottom‐up approach hard to regulate the manufacturing method and may announce defects in 2D materials.…”

Section: Introductionmentioning

confidence: 99%

Advances in Liquid‐Phase and Intercalation Exfoliations of Transition Metal Dichalcogenides to Produce 2D Framework

Raza

Hassan

Ikram

et al. 2021

Adv Materials Inter

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(5 of 46)www.advmatinterfaces.de Figure 3. a) Electronic band structure of various 2D materials. Reproduced under the terms of the CC-BY 4.0 license. [95] Copyright 2016, The Authors, published by MDPI. b) Energy level diagrams of various TMDCs. Reproduced with permission. [19] Copyright 2017, Elsevier B.V. c) Archetypal coordination of TMDCs, octahedral coordination forms 1T structures, while triangular prismatic coordination establishes 2H/3R structures. Reproduced with permission. [82] Copyright 2019, Elsevier. d) Structural top view of various polytypes; in 2H, two layers per repeat, the unit shows trigonal prismatic coordination and in 1T, one layer per repeat unit formed octahedral coordination of TMDCs. Reproduced with permission. [89] Copyright 2012, Springer Nature. e) 3D illustration of typical MX 2 structure having chalcogen (yellow atom) and metal (gray atom). Reproduced with permission. [104] Copyright 2011, Springer Nature. f) Schematic demonstration of phonon active modes and their symmetries of bulks and monolayer in MX 2 structures. Reproduced under the terms of the CC-BY 3.0 license. [105]

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Glass-assisted CVD growth of large-area MoS2, WS2 and MoSe2 monolayers on Si/SiO2 substrate

Cited by 34 publications

References 34 publications

Glass‐Assisted Chemical Vapor Deposition‐Grown Monolayer MoS₂: Effective Control of Size Distribution via Surface Patterning

Glass‐Assisted Chemical Vapor Deposition‐Grown Monolayer MoS₂: Effective Control of Size Distribution via Surface Patterning

Emerging MoS2 Wafer-Scale Technique for Integrated Circuits

Advances in Liquid‐Phase and Intercalation Exfoliations of Transition Metal Dichalcogenides to Produce 2D Framework

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Glass-assisted CVD growth of large-area MoS2, WS2 and MoSe2 monolayers on Si/SiO2 substrate

Cited by 34 publications

References 34 publications

Glass‐Assisted Chemical Vapor Deposition‐Grown Monolayer MoS2: Effective Control of Size Distribution via Surface Patterning

Glass‐Assisted Chemical Vapor Deposition‐Grown Monolayer MoS2: Effective Control of Size Distribution via Surface Patterning

Emerging MoS2 Wafer-Scale Technique for Integrated Circuits

Advances in Liquid‐Phase and Intercalation Exfoliations of Transition Metal Dichalcogenides to Produce 2D Framework

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Product

Resources

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Glass‐Assisted Chemical Vapor Deposition‐Grown Monolayer MoS₂: Effective Control of Size Distribution via Surface Patterning

Glass‐Assisted Chemical Vapor Deposition‐Grown Monolayer MoS₂: Effective Control of Size Distribution via Surface Patterning