“…Next, vacuum (∼10 −3 mbar) anodic bonding of a 0.5 mm thick borosilicate glass substrate (Borofloat 3.3, Schott, Germany; 450 • C, 2 kV) and a previously micromachined silicon substrate was carried out. In the next step, glass reflow (800 • C, 1 h) was carried out according to a previous procedure optimised by us for the fabrication of glass microlenses or prisms [21,22]. Next, the redundant glass layer was removed (mechanically polished) from the top side of the thick membrane.…”