Advances in Glass Science and Technology 2018
DOI: 10.5772/intechopen.74179
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Glass Patterning: Technologies and Applications

Abstract: In this work, we review the progress in recent studies on glass patterning including technologies and applications. Four technologies for glass micromachining including wet etching, sandblasting, reactive ion etching, and glass reflow process are analyzed. Advantages as well as disadvantages of each method are presented and discussed in light of the experiments. Various microsystem applications using the above glass patterning technologies like thermal sensors, hermetically packaged capacitive silicon resonato… Show more

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Cited by 5 publications
(5 citation statements)
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“…The wafer is subsequently immersed in an etching solution composed of HF and H 2 O 2 . MACE for high aspect ratio silicon structures was investigated in our recent work; however, this method cannot apply to this work due to the requirements of the photoresist patterning. A novel fabrication process was investigated in this work, as follows.…”
Section: Device Fabricationmentioning
confidence: 99%
See 1 more Smart Citation
“…The wafer is subsequently immersed in an etching solution composed of HF and H 2 O 2 . MACE for high aspect ratio silicon structures was investigated in our recent work; however, this method cannot apply to this work due to the requirements of the photoresist patterning. A novel fabrication process was investigated in this work, as follows.…”
Section: Device Fabricationmentioning
confidence: 99%
“…Metal‐assisted chemical etching (MACE) has received attention recently . MACE process is a simple and low cost which performed in a wet etching solution, but it enables the formation of anisotropic silicon structures at room temperature and atmospheric pressure.…”
mentioning
confidence: 99%
“…SOG can be divided into three major types: (1) silicatebased compounds, (2) organosilicon compounds, and (3) organic-dopant compounds [19]. The first two types of SOG described above are SiO 2 -based compounds.…”
Section: Sog Materialsmentioning
confidence: 99%
“…First, it is a cost‐effective process and easy to set up in the etching environment. Therefore, the wet etching process is advantageous for mass production 64–66 . Furthermore, it offers a high etch rate, superior selectivity, and cost‐effectiveness compared to other methods.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, the wet etching process is advantageous for mass production. [64][65][66] Furthermore, it offers a high etch rate, superior selectivity, and cost-effectiveness compared to other methods.…”
Section: Introductionmentioning
confidence: 99%