1984
DOI: 10.1063/1.334008
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Glow-discharge-created electron beams: Cathode materials, electron gun designs, and technological applications

Abstract: The operating characteristics of glow-discharge-created electron beams are discussed. Ten different cathode materials are compared with regard to maximum electron beam current achieved and the beam generation efficiencyas measured calorimetrically. Specific electron gun designs are presented for a variety of applications that include: cw ion laser excitation; electron beam assisted chemical vapor deposition of microelectronic films; and wide area annealing of ionimplantation damage to silicon substrates. The u… Show more

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Cited by 99 publications
(32 citation statements)
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“…Several types of cold cathode glow discharges have been utilized to produce pulsed [1]- [4] as well as CW electron beams [5], [6]. The beams produced by these discharges have been used for various materials processing applications, including annealing [7]- [9], thin film deposition [10]- [12], and the etching of diamond films [13].…”
mentioning
confidence: 99%
“…Several types of cold cathode glow discharges have been utilized to produce pulsed [1]- [4] as well as CW electron beams [5], [6]. The beams produced by these discharges have been used for various materials processing applications, including annealing [7]- [9], thin film deposition [10]- [12], and the etching of diamond films [13].…”
mentioning
confidence: 99%
“…To reduce the cathode layer effect, secondary emission coefficient was varied from the baseline value of -y0.01 to y=1.0, which comparable with the values measured for Be/Cu and A1 2 0 3 /Mo cathodes [28,29]. Townsend ionization coefficient, a, was also varied by adding up to 1000 ppm of C 9 H 15 N to the mixture, assuming that parameter C for the seed in Eqs.…”
Section: Discharge Modeling Calculationsmentioning
confidence: 99%
“…For the closed face geometry, a small fraction of the plasma electrons become beam electrons after acceleration across the cathode sheath (or other such accelerating voltage) outside the hollow cathode aperture. In the open face guns, it is the secondary electrons emitted from the cathode walls that form the beam electrons [1]. The latter is the primary electron beam source used in LAPPS [2] and the focus of this paper.…”
Section: A Backgroundmentioning
confidence: 99%