High‐fidelity micrometer‐scale patterns of alternating hydrophobic and hydrophilic materials were created on polystyrene using pulsed plasma polymerization. The hydrophobic material was formed using C3F8. Grids with 80–100 µm holes were used to generate patterns with acrylic acid, 2‐hydroxyethyl methacrylate, N‐vinyl‐2‐pyrrolidinone, N‐vinylformamide, allylamine, and hexylamine. The materials were characterized with angle‐resolved XPS, spectroscopic ellipsometry, and static CA measurements. Excellent pattern fidelity with all monomers was confirmed with SEM, SAM, XPS imaging, and static ToF‐SIMS imaging.