Glow Discharge Polymerization of Tetrafluoroethylene, 1,1 Difluoroethylene, and Chlorotrifluoroethylene

Abstract

Thin polymer films were prepared by eleetrodeless glow discharge polymerization of tetrafluoroethylene (CF2:CFf), 1,1 difluoroethylene (CFf=CH2), and chlorotrifluoroethylene (CFCI=CFf) monomers. The chemical composition of the films prepared both in and out of the glow discharge region was measured by x-ray photoelectron spectroscopy (XPS) and compared to bulk polymer standards. The glow discharge polymers exhibit a complex carbon ls XPS spectrum as compared to the bulk standards. A minimum of four bonding states for carbon is clearly seen, with relatively high concentrations of

An Introduction to Plasma Polymerization

“…Another example of a similar plasma polymerization has been reported by Rice et al [104,105]. Using a different reactor, they again found a variation in the chemical nature of fluorinated plasma polymer, as a function of position in the reactor (see the figure in d'Agostino's chapter) but with the most fluorinated polymer (containing CF 2 and CF 3 groups and exhibiting a critical surface tension below that of Teflon) deposited in the downstream nonglow region of the reactor.…”

“…As a result the properties of plasma polymer deposited in such nonglow regions more nearly approach those of conventional polymers, but the deposition rate tends to be exceedingly low [3, [103][104][105]. Thus, at relatively low power levels, the glow will tend to be localized at or near the coil or plates which give rise to the electric field.…”

Similarity of Plasma-Polymerized Tetrafluoroethylene and Fluoropolymer Films Deposited by rf Sputtering of Poly(tetrafluoroethylene)

“…Considerable literature exists on the infrared (IR) or X-ray photoelectron spectroscopic (XPS) characterization of the products obtained from plasma polymerization of tetrafluoroethylene (TFE), − and a somewhat smaller body of literature exists on the IR or XPS characterization of the fluoropolymer deposits formed in the rf plasma sputtering of poly(tetrafluoroethylene) (PTFE). ,,− Several references have noted that the structures of the fluoropolymer deposits arising from rf-sputtered PTFE (SPTFE) were similar to those of plasma-polymerized TFE (PPTFE). − ,, In none of these earlier studies were SPTFE and PPTFE prepared in the same plasma reactor. Tibbitt et al, who apparently first reported the remarkable similarity of the IR spectra of PPTFE and SPTFE, suggested that the mechanism of rf sputtering of PTFE resembled that of plasma polymerization of TFE.…”

“…Considerable literature exists on the infrared (IR) or X-ray photoelectron spectroscopic (XPS) characterization of the products obtained from plasma polymerization of tetrafluoroethylene (TFE), [1][2][3][4][5][6][7][8][9][10][11][12] and a somewhat smaller body of literature exists on the IR or XPS characterization of the fluoropolymer deposits formed in the rf plasma sputtering of poly(tetrafluoroethylene) (PTFE). 9,10,[13][14][15][16][17][18][19][20][21] Several references have noted that the structures of the fluoropolymer deposits arising from rf-sputtered PTFE (SPTFE) were similar to those of plasma-polymerized TFE (PPTFE).…”

Structural Correlation Study of Pulsed Plasma-Polymerized Fluorocarbon Solids by Two-Dimensional Wide-Line Separation NMR Spectroscopy

“…X-ray photoelectron spectroscopy (XPS) of fluorocarbon films deposited in this manner showed they contain not only CF 2 species, but a significant amount of CF, CF 3 , and quaternary carbon moieties. The CF and quaternary carbons suggest a high degree of cross-linking within the films . This is attributed to the complex precursor decomposition reactions taking place within the plasma coupled with ion bombardment of the growing film .…”