Graded refraction index antireflection coatings based on silicon and titanium oxides

Abstract

Thin films with a graded refraction index constituted from silicon and titanium oxides were deposited by plasma enhanced chemical vapor deposition using electron cyclotron resonance. A plasma of oxygen reacted with two precursors: the tetraethoxysilane (TEOS) and the titanium isopropoxide (TIPT). The automatic regulation of the precursor flows makes it possible to modify the chemical composition, and consequently the optical index, through the deposited films. To control the thickness, the refraction index and the growth kinetics, in situ spectroscopic ellipsometer was adapted to the reactor. The analysis of ex situ ellipsometric spectra measured at the end of each deposition allow to determine a refraction index profile and optical properties of the inhomogeneous deposited films. Measurements of reflectivity carried out in the ultraviolet-visible-near infrared range show that these films could be used as antireflective coatings for silicon solar cells: 3.7 % weighted average reflectivity between 300 and 1100 nm and 48 % improvement of the photo-generated current were obtained.

Optimization of Double Anti-Reflective Coating SiOx / SiNx on the Solar Cells with Silicon Conventional

“…Considering a non-encapsulated structure (n0=1) SiO X /SiN X /Substrate, with variable refractive index, SiOx (1.45≤n2≤1.5), SiNx (1.9≤n1≤2.3) for the photovoltaic cells performance improvements. Y. Lee and A. Mahdjoud [11]- [12] illustrated that the deposit of silicon nitride and silicon oxide is a promising method for obtaining a better electric current cells performances.…”

Silicon Solar Cells with Nanoporous Silicon Layer

“…Using the ARC with monotonous changeof the refractive index on the depth can raise the performance of silicon solar cells. ARCs with a graded refractive index constituted from silicon and titanium oxides mixtures were studied in [17]. 3.7% average reflectance between wavelength from 300 to 1100 nm and 48% improvement of the photocurrent was reached on using silicon and titanium oxides mixtures as graded ARC on silicon.…”

Effect of TEOS plasma polymerization on corn starch/poly(ε-caprolactone) film: characterization, properties and biodegradation

“…6 Further, depending on the plasma parameters and admixture of gases used, the resulting silicon oxide coating can vary from polymer like (organic) to pure SiO 2 (inorganic) to a hybrid with a desired specications like being hydrophilic or hydrophobic, leading to gas and moisture barrier coatings with good uniformity and good adherence to the substrate, that are chemically inert, transparent and dense. [7][8][9][10][11] M. Abbasi-Firouzjah et al described the deposition mechanism, structure and chemical composition of ppTEOS lms as a result of O 2 and Ar carrier gases as well as input power. 12 The barrier performance of a silicon oxide coating on conventional packaging materials like PET, LDPE, HDPE, PP, etc.…”