2007
DOI: 10.1016/j.sna.2006.05.026
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Gradient residual stress induced elastic deformation of multilayer MEMS structures

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Cited by 41 publications
(29 citation statements)
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“…In the first method the curvature of a flat substrate is measured after the film deposition and the residual stress is evaluated using the Stoney formula [4,7,14,29].…”
Section: Discussionmentioning
confidence: 99%
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“…In the first method the curvature of a flat substrate is measured after the film deposition and the residual stress is evaluated using the Stoney formula [4,7,14,29].…”
Section: Discussionmentioning
confidence: 99%
“…The second technique involves the measurement of the bending of the multilayer structure when all the constraints are removed [14]. This is the method usually used to evaluate the residual stress in released cantilevers.…”
Section: Discussionmentioning
confidence: 99%
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“…These structures have been used as capacitors for transistors and sensors. [7][8][9][10] This process has also been used to fabricate multilayer microscale polymeric vesicles for drug delivery. 11,12 Here, we employ scrolling in the fabrication of adaptable polymer particles that can alter their geometry when triggered by given stimuli, such as temperature, thus altering flow characteristics and adsorption properties, provide understanding of how the materials and processing conditions alter the particle geometry, and quantify the responsive kinetics for these particles.…”
mentioning
confidence: 99%
“…Later on, based on Stoney formula various models have been developed [12][13][14][15][16][17][18] to address numerical computations of uniform residual strain in the coating. Recently, a model using computational techniques identified that the corrosion at the interface of coating and substrate is inhibited by compressive residual stress in coating due to the contraction of open corrosion paths in the coatings [19].…”
Section: Introductionmentioning
confidence: 99%