The arrival of high-mobility
two-dimensional materials
like graphene
leads to the renaissance of former vertical semiconductor–metal–semiconductor
(SMS) hot electron transistors. Because of the monolayer thickness
of graphene, improved SMS transistors with a semimetallic graphene-base
electrode are now feasible for high-frequency applications. In this
study we report about a device that consists of amorphous silicon,
graphene, and crystalline silicon. For the first time, this device
is fabricated by a four-mask lithography process which leads to significant
improvements in the device performance. A strongly increased common-emitter
current gain of 2% could be achieved while the on–off ratio
improved to 1.6 × 105, which is already higher than
predicted theoretically. This could be mainly attributed to better
interface characteristics and decreased lateral dimensions of the
devices. A cutoff frequency of approximately 26 MHz could be forecasted
based on the DC measurements of the device.