2015
DOI: 10.1016/j.jcrysgro.2015.07.030
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Graphene-like AlN layer formation on (111)Si surface by ammonia molecular beam epitaxy

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Cited by 78 publications
(43 citation statements)
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“…The relaxed lattice constants of graphene and AlN monolayers are 2.46 and 3.08 Å, respectively, as consistent with reports [36,37]. We first calculated the band structures of graphene, g-AlN, g-AlN monolayer with an aluminum vacancy (g-AlN-V Al ) or a nitrogen vacancy (g-AlN-V N ) to better compare the electronic differences of graphene and g-AlN monolayer before and after contacting, as shown in Figure 1.…”
Section: Sublayers and Heterostructuressupporting
confidence: 91%
“…The relaxed lattice constants of graphene and AlN monolayers are 2.46 and 3.08 Å, respectively, as consistent with reports [36,37]. We first calculated the band structures of graphene, g-AlN, g-AlN monolayer with an aluminum vacancy (g-AlN-V Al ) or a nitrogen vacancy (g-AlN-V N ) to better compare the electronic differences of graphene and g-AlN monolayer before and after contacting, as shown in Figure 1.…”
Section: Sublayers and Heterostructuressupporting
confidence: 91%
“…More recently, few monolayer thick flat h-AlN was formed on an Si(111) surface by molecular beam epitaxy with a lattice constant of 3.08 Å. 22 Also, 2D GaN has been synthesized via graphene encapsulation. 23 Theoretical and experimental studies show that monolayer h-GaN and h-AlN are indirect, wide band gap semiconductors.…”
Section: Introductionmentioning
confidence: 99%
“…32 In a more recent study, few monolayers thick flat h-AlN was formed on Si (111) surface by molecular beam epitaxy, with lattice constant of h-AlN being 3.08 Å . 48 Much recently, 2D GaN has been synthesized via graphene encapsulation, which is a significant achievement pointing GaN to be an important nanomaterial in 2D flexible optoelectronics. 49 In this study, the growth of wurtzite phase of GaN (wz-GaN) on SiC(0001) was initially realized in the forms of 3D islands [see Fig.…”
mentioning
confidence: 99%