1990
DOI: 10.1016/s0022-0248(08)80124-8
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Gravity effect on solute transport in dissolution and growth of silicon

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Cited by 19 publications
(14 citation statements)
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“…Following Kimura et al [22], a schematic view of the model considered in this study is given in figure 1. Horizontal silicon substrates of 2 cm × 2 cm are set face to face, 4 mm apart.…”
Section: Numerical Modelmentioning
confidence: 99%
See 1 more Smart Citation
“…Following Kimura et al [22], a schematic view of the model considered in this study is given in figure 1. Horizontal silicon substrates of 2 cm × 2 cm are set face to face, 4 mm apart.…”
Section: Numerical Modelmentioning
confidence: 99%
“…This indicated that solutal convection accelerates the transport of silicon upwards. Kimura et al [22] carried out a similar experiment 3 Author to whom correspondence should be addressed.…”
Section: Introductionmentioning
confidence: 99%
“…Sukegawa et al [73,214,215] developed a 'yo-yo' technique for silicon and III-V compounds. Analysis of convectively driven growth in silicon LPE systems has been described by Kimura et al [217][218][219][220], Dost et al [221], and Coşkun et al [222]. The temperature is programmed to cycle between two constant temperature stages.…”
Section: Convection ("Yo-yo" Method)mentioning
confidence: 99%
“…Huang et al (2015) remarkably demonstrated the recession of a dissolving solid in a high-speed laminar flow and the effect of the solid body geometry on the dissolution process. Accordingly, to predict the dissolution rate and pattern formation successfully, several factors, including the flow and body geometry, must be considered in addition to the mass transfer on the dissolving surface (Kimura, Tanaka & Sukegawa 1990;Sullivan, Liu & Ecke 1996;Huang et al 2015;Nakouzi, Goldstein & Steinbock 2015;Philippi et al 2019;Cohen et al 2020). The effects of gravitational instability on the dissolution rate and pattern formation under a stationary solvent condition have been studied, but only in a limited manner.…”
Section: Introductionmentioning
confidence: 99%