Grayscale e-beam lithography: Effects of a delayed development for well-controlled 3D patterning

Mortelmans, Thomas; Kazazis, Dimitrios; Guzenko, Vitaliy A.; Padeste, Celestino; Braun, Thomas; Stahlberg, Henning; Li, Xiaodan; Ekinci, Yasin

doi:10.1016/j.mee.2020.111272

Cited by 23 publications

(30 citation statements)

References 19 publications

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“…They showed that this enhanced thermal treatment breaks down a significant portion of the photoactive materials, which allows to decrease the relationship between the development rate and the exposure dose. Mortelmans et al 19 and Unno et al 20 investigated the influence of a PEB on the dose-response behavior of PMMA and NIMO-P0701 resist, respectively, using electron beam lithography. They obtained a decrease in the depth of development if a PEB is carried out at high temperatures and for a longer time for a given dose.…”

Section: Resultsmentioning

confidence: 99%

Optimized ultraviolet grayscale process for high vertical resolution applied to spectral imagers

Gerges

Petit-Etienne

Panabière

et al. 2021

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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NanoCarb is a miniature Fourier transform imaging spectrometer dedicated to the measurement of atmospheric CO2 and CH4. The key element of NanoCarb is an array of Fabry–Perot microinterferometers having a stepcase shape. Lateral dimensions and height of each step depend on the used material, the focusing lenses, and the targeted optical path difference to be measured. In this paper, we developed a grayscale lithography process for a large surface patterning with high vertical resolution. This process is combined with plasma etching to transfer the as-obtained resist patterns into the silicon substrate. This method is an efficient and quick way for the realization of such arrays into silicon. A low contrast resist (ma-P1225G) was used for better control of the step height, and we investigated the effect of two annealing processes on the contrast curve slope: the soft bake and the postexposure bake. Therefore, combining the two processes leads to a 20 nm step height resolution in resist and 50 nm in silicon.

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Section: Resultsmentioning

confidence: 99%

Optimized ultraviolet grayscale process for high vertical resolution applied to spectral imagers

Gerges

Petit-Etienne

Panabière

et al. 2021

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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“…Finally, it is worth mentioning that EBL can also be employed to create vertical grayscale patterns down to sub-10 nm step height [ 64 ]. Recent examples include fabrication in PMMA of 6 nm multilevel grayscale patterns [ 64 ] ( Figure 4 d) as well as of 3D structures with several micrometers in height and exhibiting a pie-chart shape [ 29 ]. More details on the next generation of EBL resists [ 66 ] and on the evolution of EBL technique [ 77 ] can be further consulted in the literature.…”

Section: Top–down Lithographic Methodologiesmentioning

confidence: 99%

“…These methodologies can be used separately [ 23 , 24 , 25 , 26 ] or combined [ 27 , 28 ]. The top–down methodology is breaking down the material system by removing molecules or atoms using electrons [ 29 ], ions [ 30 ], protons [ 31 ], light [ 32 ], etc. and leaving a clearer pattern on the surface of the material ( Figure 1 a), while the bottom–up methodology is based on building different blocks or stacking molecules on top of each other ( Figure 1 b).…”

Section: Introductionmentioning

confidence: 99%

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

Handrea-Dragan

Botiz

2021

Polymers

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There is an astonishing number of optoelectronic, photonic, biological, sensing, or storage media devices, just to name a few, that rely on a variety of extraordinary periodic surface relief miniaturized patterns fabricated on polymer-covered rigid or flexible substrates. Even more extraordinary is that these surface relief patterns can be further filled, in a more or less ordered fashion, with various functional nanomaterials and thus can lead to the realization of more complex structured architectures. These architectures can serve as multifunctional platforms for the design and the development of a multitude of novel, better performing nanotechnological applications. In this work, we aim to provide an extensive overview on how multifunctional structured platforms can be fabricated by outlining not only the main polymer patterning methodologies but also by emphasizing various deposition methods that can guide different structures of functional nanomaterials into periodic surface relief patterns. Our aim is to provide the readers with a toolbox of the most suitable patterning and deposition methodologies that could be easily identified and further combined when the fabrication of novel structured platforms exhibiting interesting properties is targeted.

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“…The TR and CW necessitate nanoscale topography control over several millimeters and simultaneous integration of various micro and nano uidic components. To overcome these challenging fabrication requirements, high precision gray scale e-beam lithography (g-EBL) is employed to pattern the nano uidic device following a process that we developed recently through extensive process optimization 12 . This highresolution structure is subsequently replica-molded to obtain a negative polymeric stamp, enabling costeffective upscaling of fabrication through nanoimprint lithography (Fig.…”

Section: Main Textmentioning

confidence: 99%

A nanofluidic device for rapid and multiplexed SARS-CoV-2 serological antibody detection

Mortelmans

Kazazis

Padeste

et al. 2021

Preprint

Self Cite

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The outbreak of COVID-19 has led to a substantial death toll and has hindered the functioning of modern society, sending the world into a medical and economic crisis1,2. This underlined the importance of point-of-care diagnostics, as well as accurate, cost-effective serological antibody tests as well as point-of-care diagnostics to monitor the viral spread and contain pandemics and endemics. Here, we present a three-dimensional (3D) nanofluidic device for rapid and multiplexed detection of viral antibodies. The device is designed to size-dependently immobilize particles from a multi-particle mixture at predefined positions in nanochannels through capillary forces only, resulting in distinct trapping lines. We show that individual lines can be used as an on-chip fluorescence-linked immunosorbent assay for multiplexed detection of serological immunoglobulin antibodies against viral proteins with high sensitivity. Further device versatility is exhibited by on-bead color multiplexing for simultaneous detection of IgG and IgM antibodies in convalescent human serum and by concurrent detection of anti-spike (SARS-CoV-2) and anti-hemagglutinin (Influenza A) antibodies. The device’s applications can be further extended to detect a plethora of diseases simultaneously in a reliable and straightforward manner.

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Grayscale e-beam lithography: Effects of a delayed development for well-controlled 3D patterning

Cited by 23 publications

References 19 publications

Optimized ultraviolet grayscale process for high vertical resolution applied to spectral imagers

Optimized ultraviolet grayscale process for high vertical resolution applied to spectral imagers

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

A nanofluidic device for rapid and multiplexed SARS-CoV-2 serological antibody detection

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