Grid-supported EUV pellicles: A theoretical investigation for added value

Abstract

EUV pellicle membranes are being pursued to protect scanner images from repeating defects caused by reticle fall-on particle defects. Because most materials highly absorb EUV, pellicle membranes must be ultrathin. In an attempt to increase the strength of the ultrathin membranes, grid-supported pellicle membranes have been proposed. In this study we compare grid-supported pellicles (GSP) over free-standing pellicles (FSP). We considered imaging, thermal, mechanical, and thermo-mechanical characteristics. Finite Element Methods (FEM) was used to investigate the thermal, and (thermo-)mechanical behavior of pellicles. The maximum temperature reached under operational conditions by the pellicle film was determined. Using a thermo-mechanical analysis wrinkling behavior was quantified. The mechanical analysis considered the influence of grid structures on the sagging behavior, on crack propagation, on the pellicle film resistance to collision with solid particles, and on the resistance to shocks on the pellicle frame. The analysis shows that GSP that meets imaging requirements will not bring any advantages over FSP.

Pellicle films supporting the ramp to HVM with EUV

“…Pellicles are primarily developed for use in EUV lithography for logic 1 and product specifications and the nature of EUV absorption require that EUV pellicles are incredibly thin [2][3][4][5][6][7][8][9][10] . Not many materials allow 'good' EUV transmission 10 as seen in figure 1, which shows why Si was historically chosen as EUV pellicle film.…”