Group 2 element β-diketonate complexes: synthetic and structural investigations

Otway, David J.; Rees, William S.

doi:10.1016/s0010-8545(00)00360-x

Cited by 117 publications

(72 citation statements)

References 99 publications

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“…This is in accordance with the fact of the higher volatility of the Sr compound as compared to the Ba compound. [24] Despite this difference, all curves in Figure 3a are terminated practically at the same temperature (about 300 8C). It can be explained as follows: at elevated temperatures (more than 220-250 8C), the evaporation of the AEE b-diketonates slows down due to the competitive process of their oligomerization.…”

Section: Thermal Analysismentioning

confidence: 94%

“…3) in stoichiometric ratios in EtOH or hydrocarbons. This method is simpler than that previously described, [24] because basic and stable AEE compounds are used for precursor preparation and there is no need for using anhydrous and inert conditions for synthesis with tetraglyme or the longer polyglyme (n ! 4).…”

Section: Synthesis and Characterization Of New Barium And Strontium Pmentioning

confidence: 99%

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Novel Low Melting Point Barium and Strontium Precursors for the MOCVD Growth of Barium‐Strontium‐Titanate Films

Kuzmina¹,

Малкерова²,

Alikhanyan³

et al. 2009

Chemical Vapor Deposition

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Novel barium and strontium precursors, belonging to the family of volatile complexes of the alkaline earth element (AEE) fluorinated b-diketonates with polyglymes, [M(dfhd) 2 (tetraglyme)] [Hdfnd ¼ 1,1,1,2,2,6,6,7,7,7-dekafluoro-heptane-3,5-dione, M ¼ Ba (I), Sr (II)], are synthesized and tested with an aim to use them for metal-organic (MO)CVD of Ba x Sr 1-x TiO 3 (BST) thin films. The thermal behavior and composition of vapor phases for compounds I and II are studied by thermal analysis and mass spectrometry (MS). Considerable reduction of the melting point (down to 80-90 8C) for both compounds I and II, as compared to known volatile complexes, is achieved. By means of the developed precursors, epitaxial BST films (x ¼ 0.5) are grown on SrTiO 3 substrates by using the modified MOCVD facility. The quality of the grown films is examined by high-resolution (HR) X-ray diffraction (XRD) and high-resolution (HR) scanning electron microscopy (SEM).

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Section: Thermal Analysismentioning

confidence: 94%

Section: Synthesis and Characterization Of New Barium And Strontium Pmentioning

confidence: 99%

Novel Low Melting Point Barium and Strontium Precursors for the MOCVD Growth of Barium‐Strontium‐Titanate Films

Kuzmina¹,

Малкерова²,

Alikhanyan³

et al. 2009

Chemical Vapor Deposition

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“…alkaline-earth metals. For example, barium dipivaloylmethanate, which is widely used as a precursor in MO CVD, is a tetramer (Otvay & Rees, 2000), while introducing more bulky substitutes (R 1 =-C(n-C 6 H 13 )(CH 3 )(OCH 3 ), R 2 =-CH(n-C 4 H 9 )(CH 3 )) into the ligand leads to decrease of the oligomerization extent to 2 . Although the molecular weight of the latter barium complex decreases substantially, its volatility remains lower than that of barium dipivaloylmethanate.…”

Section: Application Of Thermodynamics To Biological and Materials Scmentioning

confidence: 99%

Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics

Игуменов¹,

Basova²,

Belosludov³

2011

Application of Thermodynamics to Biological and Materials Science

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“…A wide range of such compounds have been synthesized and are commercially available. [7] In a recent review by Miikkulainen et al, [8] the main sources of metals for ALD of magnesium and calcium oxide films are said to be Mg(tmhd) 2 , [9] Ca(tmhd) 2 , MgCp 2 , [10] Mg(CpEt) 2 , [6] and Ca( i Pr 3 Cp) 2 . [5] The main issue with b-diketonates has been their low basicity and inertness towards proton transfer in ALD.…”

Section: Introductionmentioning

confidence: 99%

Modeling of Precursors for Atomic Layer Deposition of Magnesium and Calcium Oxide

Kazadojev

Otway

Elliott

2013

Chemical Vapor Deposition

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We present a study of magnesium and calcium precursor molecules in order to predict which of them would be more successful in atomic layer deposition (ALD) of metal oxides. Precursor chemistry plays a key role in ALD, since precursors must be volatile, thermally stable, chemisorb on the surface, and react rapidly with existing surface groups. We investigate one aspect of this, surface reactivity between ligands and hydroxyl groups, via a gas-phase model with energetics computed at the level of density functional theory (DFT). The precursors with higher reactivity towards hydrolysis (and thus most potentially useful for ALD) are M(bae), M(Ph-nacnac) 2 , and M(tmtate), which is rationalized as due to strain, particularly in the cyclic ligands bae and tmtate. Calculated trends for Mg and Ca follow each other closely, reflecting the similar chemistry among group 2 metals.

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Group 2 element β-diketonate complexes: synthetic and structural investigations

Cited by 117 publications

References 99 publications

Novel Low Melting Point Barium and Strontium Precursors for the MOCVD Growth of Barium‐Strontium‐Titanate Films

Novel Low Melting Point Barium and Strontium Precursors for the MOCVD Growth of Barium‐Strontium‐Titanate Films

Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics

Modeling of Precursors for Atomic Layer Deposition of Magnesium and Calcium Oxide

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