Growth and characterisation of Hg1 − xCdxTe (0.21 &lt; x &lt; 0.36) epilayers grown from Te-rich solution by the dipping technique

Gupta, Shrish C.; Sitharaman, S.; Nagpal, Anjana; Gautam, M.; Berlouis, L.E.A.

doi:10.1016/0022-0248(95)00993-0

Cited by 8 publications

(3 citation statements)

References 18 publications

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“…Edwall et al [33], for example, have claimed that, on the 111 B face, a misorientation of up to 2 • could give rise to surface undulations with a peak-to-valley height on the surface of 100-500 nm. Such large variations in the surface layer would have been detected by both the doublecrystal x-ray rocking curve (using InSb as the first crystal) [34] and electrolyte electroreflectance (EER) measurements [35] which were carried out on this sample. A value in the range 50-70 arc seconds for the FWHM was obtained from the rocking curves and, from the EER measurements, a broadening parameter of 0.11 eV was recorded.…”

Section: Discussionmentioning

confidence: 99%

Second-harmonic generation in the characterization of surface effects in epitaxial layers

Berlouis

Wark

Cruickshank

et al. 1998

Semicond. Sci. Technol.

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Second-harmonic (SH) rotational anisotropy measurements performed on epitaxial Cd x Hg 1−x Te (CMT) layers grown on CdTe 111 B substrate exhibits an interference in the SH signal originating from the bulk and from the CMT surfaces. The threefold symmetry of the epilayer was shown to be sensitive to the nature of adsorbed species at the surface when in contact with an electrolyte solution despite the strong SH generation in the bulk of the layer. The modification of the SH response from a non-centrosymmetric semiconducting material to such an extent is unusual since bulk SH generation is considered as the dominant contributor in these instances. The case of CMT is, however, rather specific in that the observed SH signal originates from, at most, only the top 40 nm of the CMT epilayer. This important difference means that surface modification by means of electron donating or withdrawing groups will play a large role in the observed SHG signal.

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Section: Discussionmentioning

confidence: 99%

Second-harmonic generation in the characterization of surface effects in epitaxial layers

Berlouis

Wark

Cruickshank

et al. 1998

Semicond. Sci. Technol.

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“…Variable temperature Hall measurements were carried out using S-110 Keithley Hall measurement system. MCT epilayers were grown on these substrates from Terich solution using liquid phase epitaxial (LPE) process [8].…”

Section: Methodsmentioning

confidence: 99%

Effect of hydrogenation on the electrical and optical properties of CdZnTe substrates and HgCdTe epitaxial layers

Sitharaman

Raman

Durai

et al. 2005

Journal of Crystal Growth

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“…Nanostructures are becoming increasingly important for technology and basic science. 1 Fabrication techniques currently employed for material deposition include low-pressure chemical vapor deposition (LPCVD), 2 laser-assisted chemical vapor deposition (LCVD), 3 plasma-enhanced chemical vapor deposition (PECVD), 4,5 ultraviolet stereo lithography, 6 spinning, 7 dipping, 8 spraying, 9 and electrodeposition. [10][11][12][13][14][15] Electrodeposition methods have many advantages over the other stated techniques and are attractive, as they are simple, inexpensive, reproducible, and damage-free.…”

mentioning

confidence: 99%

Localized Electrochemical Deposition of Copper Microstructures

El-Giar

Said

Bridges

et al. 2000

J. Electrochem. Soc.

151

112

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Nanostructures are becoming increasingly important for technology and basic science. 1 Fabrication techniques currently employed for material deposition include low-pressure chemical vapor deposition (LPCVD), 2 laser-assisted chemical vapor deposition (LCVD), 3 plasma-enhanced chemical vapor deposition (PECVD), 4,5 ultraviolet stereo lithography, 6 spinning, 7 dipping, 8 spraying, 9 and electrodeposition. [10][11][12][13][14][15] Electrodeposition methods have many advantages over the other stated techniques and are attractive, as they are simple, inexpensive, reproducible, and damage-free. In addition, many materials can be deposited using electrodeposition, including metals, metal alloys, conducting polymers, and semiconductors with essentially no limitations on the size of the substrate or on the thickness of the deposited material. 16 Scanning probe microscopy (SPM) such as scanning tunneling microscopy (STM), 17 atomic force microscopy (AFM), 18 and scanning electrochemical microscopy (SECM) 19 has been widely used as a tool for surface imaging with atomic resolution. Furthermore, creation of structures using SPM has lately attracted considerable attention. 20-23 Using SPM for surface modification has advantages in that the modification process can be followed in real time and submicrometer resolution can be achieved. 24-25 SPM-based nanofabrication has potential uses in applications such as high-density information storage, high-resolution lithography, and production of nanoscale integrated chemical systems and electronic devices.Several groups have employed SPM to deposit metal and polymer microstructures. [28][29][30][31] Bard et al. 32 used the SECM to deposit different metals (e.g., Cu, Ag, Au, Pd) on polymer-coated substrates, whereas Shahat and Mandler et al. used the same technique to deposit Ni(OH) 2 structures 33 from aqueous solutions by changing the pH locally on the substrate and gold patterns by the controlled dissolution of a gold ultramicroelectrode (UME) tip. 34 Wipf and Zhou 35 used the "microreagent" SECM mode to deposit conducting polyaniline patterns on different substrates. Lagraff and Gewirth 36 employed the tip of an AFM to direct the growth of nanoscopic copper protrusions, whereas Madden and Hunter used a tip-directed scheme to deposit several micrometer-scale nickel structures. 25 In tip-directed localized deposition, 32 a faradaic current flows through the solution between a UME tip and a metal substrate electrode all immersed in an ionically conducting electrolyte when a bias voltage is applied between these two electrodes. If reducible metal ions are present in the electrolyte (e.g., Cu 2ϩ ions) and the substrate electrode potential is negative with respect to the tip electrode, then the passage of the faradaic current results in the deposition of metal on the substrate and an oxidation process at the tip. The magnitude of the faradaic current is kept constant by means of a conventional feedback control that monitors the current and adjusts the interelectrode spacing according...

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Growth and characterisation of Hg1 − xCdxTe (0.21 < x < 0.36) epilayers grown from Te-rich solution by the dipping technique

Cited by 8 publications

References 18 publications

Second-harmonic generation in the characterization of surface effects in epitaxial layers

Second-harmonic generation in the characterization of surface effects in epitaxial layers

Effect of hydrogenation on the electrical and optical properties of CdZnTe substrates and HgCdTe epitaxial layers

Localized Electrochemical Deposition of Copper Microstructures

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