Growth and characterization of chemical vapor deposition diamond coating incorporated amorphous carbon with high Raman bands induced by CuO particles

Ju, Fasong; Zhou, Fan; Chen, Shuai; Wei, Kun; He, Ping

doi:10.1016/j.diamond.2021.108387

Cited by 16 publications

(8 citation statements)

References 21 publications

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“…According to the Raman spectra shown in Figure b, it could be found that base peaks of the PET substrate could still be observed under this condition. The characteristic peaks of a-C were generally around 1350 and 1580 cm –1 , corresponding to peak D and peak G, respectively. , Figure c shows the Raman spectra of PET treated by a mixed plasma of carbon and copper with different graphite target currents. When the graphite target current was 0.5 A, no characteristic peaks could be detected from the sample surface, which indicated that a continuous a-C structure was not formed in the mixed C/Cu layer.…”

Section: Resultsmentioning

confidence: 99%

“…According to the Raman spectra shown in Figure4b, it could be found that base peaks of the PET substrate could still be observed under this condition. The characteristic peaks of a-C were generally around 1350 and 1580 cm −1 , corresponding to peak D and peak G, respectively 35,36. Figure4cshows the Raman spectra of PET treated by a mixed plasma of carbon and copper with different graphite target currents.…”

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confidence: 99%

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Achieving Good Bonding Strength of the Cu Layer on PET Films by Pretreatment of a Mixed Plasma of Carbon and Copper

Wang

et al. 2023

ACS Appl. Mater. Interfaces

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Cu layers were fabricated on PET films with and without pretreatment by a mixed plasma composed of carbon and copper using a magnetron sputtering technique for potential application as the flexible copper-clad laminate (FCCL) in 5G technology. In order to evaluate the effect of carbon plasma on the composited layer, the graphite target current was adjusted from 0.5 to 2.0 A. The microstructures and properties of Cu layers on PET films with different treatments were measured by an X-ray powder diffractometer, X-ray photoelectron spectroscope, Raman spectroscope, scanning electron microscope, transmission electron microscope, scratching test, indentation test, and four-probe detector. The results showed that the organic polymer carbon structure on the surface of PET films was changed to inorganic amorphous carbon due to the effect of the carbon plasma. At the same time, the active free radicals formed in the transition process react with metal copper ions to form organometallic compounds. Under the treatment of a mixed plasma of carbon and copper, the C/Cu mixed layer was formed on the PET film at the top of the substrate. Due to the presence of C/Cu mixed interlayers, the bonding strengths between the final Cu layers and the PET film substrates were improved, and the strongest bonding strength appeared when the graphite target current was 1.0 A. In addition, the presence of the C/Cu mixed interlayer enhanced the toughness of the Cu layer on PET film. It was proposed that the good bonding strength in combination and the enhanced toughness for the Cu layer on a PET film was due to the formation of a C/Cu mixed interlayer induced by the pretreatment of a mixed plasma of carbon and copper.

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Section: Resultsmentioning

confidence: 99%

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confidence: 99%

Achieving Good Bonding Strength of the Cu Layer on PET Films by Pretreatment of a Mixed Plasma of Carbon and Copper

Wang

et al. 2023

ACS Appl. Mater. Interfaces

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“…Але, алмазне покриття має низьку ударну в'язкість з-за своєї надтвердості, що може призвести до відшарування або руйнування покриття. У роботі [4] був запропонований новий метод хімічного осадження з парової фази, коли алмазне покриття з частинками CuO було нанесено на підкладку WC/Co. Для порівняння також було виготовлено чисте алмазне покриття.…”

Section: рис 1 загальний вигляд алмазних порошків із покриттям Rvd (а...unclassified

Modern Developments in the Application of Metallic Coatings on the Grains of Diamond Grinding Powder for Grinding Tools

Lavrinenko,

Ilnytska,

Solod

2024

TST

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“…However, the brittleness and the lack of ductility of Si 3 N 4 will lead to a drawback of the as-deposited diamond coating that is prominently susceptible to fracture failure [11,12]. Meanwhile, diamond coatings on WC-Co and Si 3 N 4 substrates present a great difference in adhesive strength and creak propagation [13,14]. Signi cant research effort has already been devoted to the improvement of adhesive strength between coating and substrate [15][16][17][18].…”

Section: Introductionmentioning

confidence: 99%

Mechanism of different adhesive strength of chemical vapor deposition diamond coatings on WC-Co and Si3N4: from surface morphologies during growth

Cao

Zeng

et al. 2022

Preprint

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Substrate has an essential influence on the growth process of diamond grains and the quality of the diamond coating. In this paper, the diamond coatings on Co-cemented tungsten carbide (WC-Co) and silicon nitride (Si3N4) substrates were deposited by hot filament chemical vapor deposition (HFCVD) technique to study the effect of growth process on adhesive strength of coating. The WC-Co and Si3N4 substrates were treated by etching and polishing process, respectively. Scanning electron microscopy (SEM), X-ray diffraction (XRD) and Raman spectroscopy were used to characterize the diamond coatings. Furthermore, the adhesive strength and tribological properties of the as-deposited diamond coatings were evaluated by indentation tests and dry sliding tests. The results showed that the diamond coating deposited on WC-Co had a considerable stronger adhesive strength and a higher friction coefficient than that on Si3N4, which may partly result from the flat surface morphologies of Si3N4 substrate that was due to no etching pretreatment. Thereafter, a novel etching method for Si3N4 surfaces by hydrofluoric acid (HF) was proposed to roughen the surface, and a new diamond coating with enhanced adhesive strength was fabricated on Si3N4. Hence, for the hard substrate, etching the surface, rather than polishing the surface, played an importance role on improving the adhesion strength of diamond coating.

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Growth and characterization of chemical vapor deposition diamond coating incorporated amorphous carbon with high Raman bands induced by CuO particles

Cited by 16 publications

References 21 publications

Achieving Good Bonding Strength of the Cu Layer on PET Films by Pretreatment of a Mixed Plasma of Carbon and Copper

Achieving Good Bonding Strength of the Cu Layer on PET Films by Pretreatment of a Mixed Plasma of Carbon and Copper

Modern Developments in the Application of Metallic Coatings on the Grains of Diamond Grinding Powder for Grinding Tools

Mechanism of different adhesive strength of chemical vapor deposition diamond coatings on WC-Co and Si3N4: from surface morphologies during growth

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